High Resolution Diffractive x-ray Optics and Soft x-ray Nanotomography

高分辨率衍射 X 射线光学和软 X 射线纳米断层扫描

• 批准号: 9510499
• 负责人: Chris Jacobsen
• 金额: $ 18.01万
• 依托单位: SUNY at Stony Brook
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-02-01 至 1999-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9510499&HistoricalAwards=false
• 关键词: Resolution; Diffractive; ray; Optics; Soft

Chris Jacobsen ECS-9510499 The capabilities and applications of x-ray focusing will be developed through development of high resolution diffractive x-ray optics. This work will be undertaken in an academic-industrial collaboration with Don Tennant of ATT Bell Laboratories (Holmdel). ATT is now installing a JEOL JBX-6000FS electron beam lithography system with a field emission gun which is just the second of its kind to be delivered to the United States. This system will be used to fabricate 20-30 nanometer resolution soft x-ray zone plates for microscopy, and diffractive optics for tests of extreme ultraviolet (EUV) lithography systems for integrated circuit printing. It will also be used to fabricate zone plates which will be used by Dr. Wen-Bing Yun of Argonne National Laboratory as x-ray lithography masks for the generation of thick zone plates for hard x-ray applications, such as fluorescence microprobe studies. The x-ray experiments will be carried out using high brightness undulators at Brookhaven National Laboratory and at Argonne National Laboratory.

Chris Jacobsen ECS-9510499 X射线聚焦的能力和应用将通过开发高分辨率衍射X射线光学器件来开发。 这项工作将与ATT贝尔实验室（霍尔姆德尔）的唐·坦南特进行学术-工业合作。 ATT现在正在安装一个带有场发射枪的JEOL JBX-6000 FS电子束光刻系统，这是第二个交付给美国的电子束光刻系统。 该系统将用于制造用于显微镜的20-30纳米分辨率的软X射线波带片，以及用于测试用于集成电路印刷的极紫外（EUV）光刻系统的衍射光学器件。 它还将用于制造波带片，阿贡国家实验室的Wen-Bing Yun博士将使用波带片作为X射线光刻掩模，用于硬X射线应用，如荧光微探针研究。 X射线实验将在布鲁克海文国家实验室和阿贡国家实验室使用高亮度波动器进行。