Cubic Boron Nitride Films From a Novel Nonequilibrium Plasma Jet Technique

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Cubic boron nitride (c-BN) films are attractive for coating wear parts because of their hardness and oxidation resistance Its wide band gap and high thermal conductivity make it a useful material for electronic applications. This work will demonstrate the feasibility of using a novel Nonequilibrium Plasma Jet (NEPJ), which is capable of depositing materials at high rates, for producing c-BN films; if successful this process should be scalable to commercial applications.