Research Initiation Award: A Novel Dual Laser Deposition Process to Facilitate the Fabrication of Planar Waveguide Lasers

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WPC 2 $ B P Z $ Courier 10cpi #| x Õm x 6 X @ 8 ; X @ HP LaserJet Series II HPLASEII.PRS x @ , t 0 OpX @Courier 10cpi Line Printer 16.67cpi 2 X V F ` ? x x x , Õm x 6 X @ 8 ; X @ k + H H H , H H @ ; @ = t t ; ! u t. t 3 y r = u u t1 , ! Q * ! ı Y 9309498 Witanachchi A novel dual laser ablation deposition of technique is proposed for the growth of optical films, towards the fabrication of low loss waveguide lasers. The proposed vapor phase deposition technique will facilitate the formation of epitaxial ND:YAG films on GaAs substrates, that would lead to the integrated opto electronic elements, such as diode pumped blue green lasers and amplifiers. The two lasers employed for the deposition process, a long pulse (100ns 1us) ? CO 2 laser and a short pulse (15ns) excimer laser, will interact with the target of the material to be deposited, and subsequently, with the laser generated plasma is obtained, complete evaporation of the microscopic particulates in the plume leading to the formation of a defect free films is expected. Extensive optical and ion probe diagnostics of the laser generated plasma plume will be performed to aid the optimization of the particulate free film growth process, and provide a fundamental understanding of the dual laser ablation technique.