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NSF/DOE Partnership in Basic Plasma Science and Engineering: Laser-Triggered Multiple Hollow-Cathode Transient Plasmas for a Multi-Component Film Manufacturing Process

NSF/DOE 在基础等离子体科学与工程领域的合作：用于多组分薄膜制造工艺的激光触发多空心阴极瞬态等离子体

基本信息

批准号：
0078917
负责人：
Sarath Witanachchi
金额：
$ 34.74万
依托单位：
University of South Florida
依托单位国家：
美国
项目类别：
Continuing Grant
财政年份：
2000
资助国家：
美国
起止时间：
2000-09-01 至 2004-08-31
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=0078917&HistoricalAwards=false
关键词：
NSF DOE Partnership Basic Plasma

项目摘要

This NSF/DOE Partnership in Basic Plasma Science and Engineering project addresses the development of a new process to generate highly ionized plasma plumes of metallic species for multi-component film growth. Multiple, laser-triggered hollow-cathode plasma sources are used for the deposition of stoichiometric multi-component films. The process affords precise control of the transient plasma dynamics and the plasma plumes can be made directional by external fields, thereby allowing the deposition of material on steps, facets or vias. The basic mechanisms involved in the formation, propagation and gas phase interactions of multiple transient metallic plasmas triggered by synchronized laser pulses is studied through Langmuir probe and in-situ optical diagnostics. These studies include the dynamics and plasma chemistry of multiple colliding plasmas as well as the effect of various plasma parameters on film stoichiometry, rate and area of growth, and the crystallinity and morphology of the films. A theoretical model is developed to simulate species propagation in a transient plasma plume. Applications that include the deposition of Cu, TiN and CuInSe2 films are used to illustrate the general feasibility of the proposed manufacturing process. This novel process will lead to high-throughput, high-quality, cost-effective, environmentally benign industrial applications in the fabrication of coatings and films.

这个NSF/DOE基础等离子体科学与工程合作项目致力于开发一种新工艺，以产生用于多组分薄膜生长的金属物质的高度电离等离子体羽流。多个激光触发的空心阴极等离子体源用于化学计量的多组分膜的沉积。该工艺可以精确控制瞬时等离子体动力学，并且可以通过外部场使等离子体羽流具有方向性，从而允许材料沉积在台阶、刻面或通孔上。利用朗缪尔探针和原位光学诊断技术研究了同步激光脉冲触发的多重瞬态金属等离子体的形成、传播和气相相互作用的基本机制。这些研究包括多个碰撞等离子体的动力学和等离子体化学以及各种等离子体参数对薄膜化学计量、生长速率和面积以及薄膜的结晶度和形态的影响。建立了一个模拟瞬态等离子体羽流中物种传播的理论模型。包括Cu、TiN和CuInSe 2膜的沉积的应用被用于说明所提出的制造工艺的一般可行性。这种新工艺将导致高产量，高质量，成本效益，环境友好的工业应用在涂料和薄膜的制造。