Experimental and Numerical Investigation of Diamond-Like Carbon Film Deposition Processes

法鲁克9310544 研究了等离子体辅助化学气相沉积法（PACVD）沉积类金刚石薄膜的基本机理。 这项研究将结合联合收割机国家的最先进的实验技术和详细的数值模拟的过程。 研究的成功完成将导致开发有效的合成和表征的DLC膜生产的PACVD过程。 该项目的主要目标是开发一种商业上可行的涂层工艺，用于在各种基材上沉积无应力的类金刚石薄膜，并具有高工艺再现性。 实验研究将包括反应堆中PACVD过程的现场监测和控制。 先进的原位监测仪器包将用于测量等离子体的关键物理化学参数以及膜中的性质、化学计量和应力。 该过程的综合数值模拟将包括反应器中的电子动力学、基于甲烷的沉积系统的等离子体化学和影响沉积过程的表面反应的考虑和相互作用。 广泛的测量能力将为模型的验证和改进提供足够的数据基础。 使用诊断能力和详细的数值模型，一组强大的工艺参数将开发规模扩大的工业反应器DLC膜沉积。

Farouk 9310544 The study addresses the fundamental mechanisms affecting the deposition of diamond-like carbon (DLC) films by the plasma assisted chemical vapor (PACVD) process. The study will combine state-of-the-art experimental techniques and detailed numerical modeling of the process. Successful completion of the research will lead to the development of effective synthesis and characterization of DLC films produced by the PACVD process. A primary objective of the project is to develop a commercially viable coating process for depositing stress-free diamond-like thin films with a high process reproducibility on various substrates. Experimental investigations will include in-situ monitoring and control of the PACVD processes in a reactor. An advanced in-situ monitoring instrumentation package will be used to measure the key physico-chemical parameters of the plasma and the properties, stoichiometry and the stress in the film. Comprehensive numerical modeling of the process will include the consideration and interaction of the electron kinetics in the reactor, plasma chemistry of a methane based deposition system and surface reactions that affect the deposition process. The extensive measurement capabilities will provide an adequate data base for the validation and improvement of the model. Using the diagnostic capabilities and the detailed numerical model, a set of robust process parameters will be developed for scaled up industrial reactors for DLC film deposition.