Analysis, Modeling and On-Line Control of Advanced Semiconductor Plasma Etching Reactors

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Whittaker 9313320 The award is for establishing a comprehensive research program in chemical analysis and chemical modeling of plasma etching reactors for semiconductor circuit manufacturing. The chemical analysis and modeling will be performed using chemically selective diagnostic data obtained by a very sensitive implementation of an infra-red diode laser absorption spectroscopy. The modeling will have the goal of establishing a new and predictive level of understanding of the plasma etch chemistry. The work is expected to have a direct impact on semiconductor electronics and manufacturing technology. The availability of the diagnostic data will help in the formulation of predictive models needed for improved etch process design and control, especially in the processing of submicron features.