U.S.-Brazil Program: Planning Visit to the University of Campinas to Plan Research on Microelectronics Technology

小行星9421668 这个美国-巴西项目奖将资助康奈尔大学Yosef Shacham博士与JW教授进行规划访问。斯沃特在巴西坎皮纳斯州立大学。 他们计划讨论他们在微电子技术方面的研究，包括旋涂玻璃膜在集成电路和无电铜沉积上的应用。此外，Shacham博士将有机会使用西姆斯分析工具来分析金属结构。这个工具只有在圣保罗大学才有，对康奈尔大学正在进行的研究非常重要。 Shacham博士还将访问教授。M.伯南布哥联邦大学的Gameiro和Edval桑托斯以及H.来自贝洛奥里藏特联邦大学的Neves讨论了他们在半导体加工、新材料、集成传感器和无电铜沉积方面的共同兴趣。 ***

9421668 Shacham This U.S.-Brazil Program award will fund a planning visit by Dr. Yosef Shacham of Cornell University to work with Prof. J. W. Swart at the Universidade Estadual de Campinas, Brazil. They plan to discuss their research on microelectronics technology, including applications of spin- on glass films to ICs and electroless copper deposition. In addition, Dr. Shacham will have the opportunity to use the SIMS analysis tool to analyze metal structure. This tool is available only at the University of Sao Paulo, and is of great importance to the research being done at Cornell. Dr. Shacham will also make visits to Profs. M. Gameiro and Edval Santos of the Universidade Federal de Pernambuco, and Prof. H. Neves from the Federal University of Belo Horizonte to discuss their common interests in semiconductor processing, new materials, integrated sensors and electroless copper deposition. ***