U.S.-Brazil Program: Planning Visit to the University of Campinas to Plan Research on Microelectronics Technology
U.S.-Brazil Program: Planning Visit to the University of Campinas to Plan Research on Microelectronics Technology
批准号:
9421668
负责人:
Y Shacham
金额:
$0.29万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-01-01 至 1995-01-31
中文摘要
9421668沙卡姆这个美国-巴西项目奖将资助康奈尔大学的约瑟夫·沙查姆博士计划访问巴西,与J·W·斯沃特教授在巴西坎皮纳斯大学合作。他们计划讨论他们在微电子技术方面的研究,包括旋转玻璃薄膜在集成电路中的应用和化学镀铜。此外,沙查姆博士还将有机会使用SIMS分析工具来分析金属结构。该工具仅在圣保罗大学可用,对康奈尔大学正在进行的研究非常重要。沙查姆博士还将拜访教授。伯南布哥联邦大学的M.Gameiro和Edval Santos,以及贝洛奥里藏特联邦大学的H.Neves教授,讨论了他们在半导体加工、新材料、集成传感器和化学铜沉积方面的共同兴趣。***
英文摘要
9421668 Shacham This U.S.-Brazil Program award will fund a planning visit by Dr. Yosef Shacham of Cornell University to work with Prof. J. W. Swart at the Universidade Estadual de Campinas, Brazil. They plan to discuss their research on microelectronics technology, including applications of spin- on glass films to ICs and electroless copper deposition. In addition, Dr. Shacham will have the opportunity to use the SIMS analysis tool to analyze metal structure. This tool is available only at the University of Sao Paulo, and is of great importance to the research being done at Cornell. Dr. Shacham will also make visits to Profs. M. Gameiro and Edval Santos of the Universidade Federal de Pernambuco, and Prof. H. Neves from the Federal University of Belo Horizonte to discuss their common interests in semiconductor processing, new materials, integrated sensors and electroless copper deposition. ***
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