Defect Mediated Thin-Film Growth

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9510663 Sieradzki This research examines issues related to the role of defect interactions in determining thin metal film growth modes. The objective is to learn how to manipulate growth parameters such that layer-by-layer growth becomes the kinetically preferred growth mode. Growth mode mechanisms are examined using combined experimental, simulation, and theoretical approaches. Electrodeposition experiments are performed using in situ scanning tunneling microscopy in order to observe the details of the growth mode transition at the atomic level. Metal-on-metal heteroepitaxial systems studied include silver/gold, copper/gold, and silver/copper. These systems permit a determination of the role of misfit in the growth mode transition. The layer-by-layer growth mode is extended into the multilayer regime by employing modifications of the electrodeposition system. Monte Carlo simulations using Embedded Atom Method potentials are performed to determine the effects of defect interactions on adatom cluster diffusivities. %%% This research has important materials implications since the layer-by-layer growth mode is desired for many important engineering applications. ***