Defect Mediated Thin-Film Growth

小行星9510663 本研究探讨有关的问题，在确定薄金属膜生长模式的缺陷相互作用的作用。 我们的目标是学习如何操纵生长参数，使逐层生长成为动力学首选的生长模式。 生长模式的机制进行检查，使用相结合的实验，模拟和理论方法。 使用原位扫描隧道显微镜进行电沉积实验，以观察在原子水平上的生长模式转变的细节。 研究的金属对金属异质外延系统包括银/金、铜/金和银/铜。 这些系统允许的生长模式转变中的失配的作用的确定。 通过采用电沉积系统的修改，逐层生长模式扩展到多层制度。 采用嵌入原子势方法进行蒙特卡罗模拟，以确定缺陷相互作用对吸附原子团簇扩散率的影响。 这项研究具有重要的材料意义，因为逐层生长模式是许多重要的工程应用所需的。 ***

9510663 Sieradzki This research examines issues related to the role of defect interactions in determining thin metal film growth modes. The objective is to learn how to manipulate growth parameters such that layer-by-layer growth becomes the kinetically preferred growth mode. Growth mode mechanisms are examined using combined experimental, simulation, and theoretical approaches. Electrodeposition experiments are performed using in situ scanning tunneling microscopy in order to observe the details of the growth mode transition at the atomic level. Metal-on-metal heteroepitaxial systems studied include silver/gold, copper/gold, and silver/copper. These systems permit a determination of the role of misfit in the growth mode transition. The layer-by-layer growth mode is extended into the multilayer regime by employing modifications of the electrodeposition system. Monte Carlo simulations using Embedded Atom Method potentials are performed to determine the effects of defect interactions on adatom cluster diffusivities. %%% This research has important materials implications since the layer-by-layer growth mode is desired for many important engineering applications. ***