SGER: Nested-Well Penning-Malmberg Trap for use as a Semiconductor Processing Plasma Reactor

SGER：用作半导体加工等离子体反应器的嵌套式彭宁-马尔姆伯格陷阱

• 批准号: 9627612
• 负责人: Carlos Ordonez
• 金额: $ 4.45万
• 依托单位: University of North Texas
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-15 至 1998-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9627612&HistoricalAwards=false
• 关键词: SGER; Nested; Well; Penning; Malmberg

9627612 Carlos Ordonez This is a Small Grant for Exploratory Research (SGER) for the development of the first analytical and computational description of a nested well Penning-Malmberg plasma processing reactor. The new nested well configuration may allow confinement of overlapping ion and electron plasmas within inner and outer electric potential wells, which provides a means for the confined ion density to exceed the severe ion density limit which occurs within the traditional single well Penning-Malmberg trap. When arranged in this novel nested well configuration therefore, Penning-Malmberg traps become potentially suitable for use as materials processing plasma reactors in microelectronics and other areas. The potential advantages of this type of reactor over existing reactors are significant: improved control of the physical to chemical etching rates with near perfect control of the plasma ion flux to processed surface, cleaner plasmas, equilibrium flat plasma density profiles for near uniformity in processing and low power requirements even with improved plasma confinement control. The design of a proposed follow-on experiment for verifying the operation description is included, in addition to the detailed theoretical analysis which forms the main body of the work. ***

9627612 Carlos Ordonez 这是探索性研究 (SGER) 的小额资助，用于开发嵌套井 Penning-Malmberg 等离子体处理反应器的第一个分析和计算描述。新的嵌套井配置可以允许将重叠的离子和电子等离子体限制在内部和外部电势井内，这提供了一种使受限制的离子密度超过传统单井彭宁-马尔姆伯格陷阱内发生的严格离子密度限制的方法。 因此，当以这种新颖的嵌套井配置排列时，彭宁-马尔姆伯格陷阱可能适合用作微电子和其他领域中的材料处理等离子体反应器。 与现有反应器相比，这种类型的反应器具有显着的潜在优势：改进了对物理化学蚀刻速率的控制，对处理表面的等离子体离子通量进行近乎完美的控制，更清洁的等离子体，平衡平坦的等离子体密度分布，以实现处理的接近均匀性，并且即使在改进的等离子体限制控制下，功率要求也较低。除了构成工作主体的详细理论分析之外，还包括用于验证操作描述的后续实验的设计。 ***