Advanced Multilayer Coatings for the Extreme Ultraviolet (EUV)

适用于极紫外 (EUV) 的先进多层镀膜

• 批准号: 9631916
• 负责人: Charles Falco
• 金额: $ 30万
• 依托单位: University of Arizona
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-15 至 2000-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9631916&HistoricalAwards=false
• 关键词: Advanced; Multilayer; Coatings; Extreme; Ultraviolet

Proposal Number: ECS-9631916 Principal Investigator: Charles Falco/University of Arizona Title: Advanced Multilayer Coatings in the Extreme Ultraviolet Abstract This research will develop techniques for producing new kinds of multilayer mirrors suitable for several applications in the extreme ultraviolet (EUV) wavelength region: projection lithography, soft x-ray microscopy, astronomy and lasers. The approach involves mirror formation by layer-by layer molecular beam epitaxy of materials combinations which is a substantial departure from the use of diffractive optics/zone plates. Interface roughness is the central problem for these short-wavelength multilayers; therefore emphasis is placed on characterizing and controlling roughness. transmission electron microscopy scanning tunneling microscopy atomic force microscopy and low angle x-ray diffraction experiments are planned to study how the interface roughness evolves from the substrate up through the multilayers. Reflectance high-energy electron diffraction and low-energy diffraction will be used in-situ to study the roughness evolution for the MBE-grown samples. Development of the multilayer mirror technique is a very flexible approach , which can be implemented widely for many applications.

提案编号：ECS-9631916 首席研究员：Charles Falco/亚利桑那大学 标题：极紫外线下的先进多层涂层 摘要 这项研究将开发生产适用于极紫外（EUV）波长区域的几种应用的新型多层反射镜的技术：投影光刻，软X射线显微镜，天文学和激光。 该方法涉及通过逐层分子束外延材料组合形成反射镜，这与使用衍射光学器件/波带片有很大的不同。 界面粗糙度是这些短波长多层膜的核心问题，因此重点放在表征和控制粗糙度。计划进行透射电子显微镜、扫描隧道显微镜、原子力显微镜和低角度X射线衍射实验，以研究界面粗糙度如何从衬底向上通过多层演变。 反射高能电子衍射和低能衍射将被用于原位研究MBE生长样品的粗糙度演变。 多层膜反射镜技术的发展是一种非常灵活的方法，可以在许多应用中广泛实施。