Elastic Properties on Thin Metal Films

9701972 POHL这是一项关于金属薄膜弹性性能的更新建议。发展了一种在低温下测量硅衬底上厚度小于10 nm的薄膜的剪切弹性模数和内耗的新技术。衬底是由0.3毫米厚的超高纯度硅片化学刻蚀而成的双桨振荡器。这些振荡器将被用来研究用各种技术沉积多晶金属薄膜。探索性测量揭示了一种类似于无定形固体的内耗。它与所使用的金属非常无关，在这一点上，它几乎不依赖于薄膜的沉积方式。作为一种可能的解释，我们将探索位错的隧穿状态。%这是对金属薄膜弹性性能的更新建议。这种衬底上的金属薄膜经常被用作微电子器件中的电流引线。为了确保它们的性能，必须识别和控制这类薄膜中的缺陷。在以前的工作中，我们开发了一种新的技术来测量硅衬底上晶体金属薄膜的弹性常数。我们已经发现，到目前为止测量的所有薄膜在低温下都有一个类似于无定形固体的内耗，这表明了相当大的无序度。这项调查的目的是确定这种障碍，并找到减少它的方法。

9701972 Pohl This is a renewal proposal on the elastic properties of thin metal films. A new technique has been developed with which the shear modulus and internal friction of films with thicknesses as small as 10 nm on silicon substrates can be measured at low temperatures. The substrates are couleDpaddle oscillators which are chemically etched out of 0.3 mm thick ultrahigh purity silicon wafers. These oscillators are to be used to study polycrystalline metal films deposition by various techniques. in which exploratory measurements have revealed an internal friction which resembles that of amorphous solids. It is remarkably independent of the metal used, and at this point shows little dependence on the way in which the film has been deposited. As a possible explanation, tunneling states of dislocations will be explored. %%% This is a renewal proposal on the elastic properties of thin metal films. This metal films on substrates are often used, e.g., as current leads in the microelectronic devices. In order to ensure their performance, defects in such films have to be identified and controlled. In previous work, we have developed a new technique for measuring elastic constants of crystalline metal films on silicon substrates. We have found that all films measured so far hjave an internal friction at low temperatures which resembles that of amorphous solids, indicating a considerable amount of disorder. The objective of this investigation is to identify this disorder, and to find ways to reduce it.