Plasma Modifications by Electron Impact Dissociation

通过电子碰撞解离进行等离子体修饰

• 批准号: 9713238
• 负责人: Philip Cosby
• 金额: $ 46万
• 依托单位: SRI International
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-08-15 至 2000-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9713238&HistoricalAwards=false
• 关键词: Plasma; Modifications; Electron; Impact; Dissociation

In this project supported by the Chemistry Division and the Division of Chemical and Transport Systems under the NSF/DOE Partnership in Basic Plasma Science and Engineering, Cosby will measure electron-impact dissociation cross sections of molecules and radicals important for plasmas at electron energies between the dissociation threshold and 200 eV. Absolute cross sections, product translational energy distributions, and product identifications will be determined for a number of small molecules and radicals, including CFx, NFx, SiFx, BFx (where x = 1-3), BCl2, BCl3, NO, N2O, SO, and SO2. The measurements will be made in a crossed electron beam-fast neutral beam apparatus. Plasmas are used to process critical materials in the electronics, aerospace, automotive, steel, biomedical, and toxic waste management industries. Therefore, it is important to be able to describe a plasma and its complex interactions with materials. The data gathered in this project will provide input into models of plasma which will allow the processing steps used in semiconductor fabrication and other areas to be improved and optimized.

在这个由化学部和化学部支持的项目中， 化学和运输系统下的NSF/能源部伙伴关系，在基础 等离子体科学与工程，考斯比将测量电子碰撞 分子和自由基的解离截面对于 等离子体的电子能量之间的解离阈值和200 EV. 绝对截面，产物平动能分布， 和产品标识将确定一些小的 分子和自由基，包括CFx、NFx、SiFx、BFx（其中x = 1-3）， BCl 2、BCl 3、NO、N2 O、SO和SO2。 测量将在 交叉电子束-快中性束装置 等离子体用于处理电子设备中的关键材料， 航空航天、汽车、钢铁、生物医学和有毒废物管理 行业 因此，能够描述等离子体是重要的 以及它与材料之间复杂的相互作用。 在此收集的数据 该项目将为等离子体模型提供输入， 在半导体制造和其它领域中使用的处理步骤， 改进和优化。