SBIR Phase I: Critical Dimension Tool for 0.18 Micron Features

*9761534 MARX SIGN系统公司将开发一种低成本、高速的关键尺寸测量工具，用于集成电路和数据存储行业的0.18米特征。该工具利用了加州理工学院开发的一项光学技术，该技术利用了亚波长大小的结构衍射的光的偏振特性。开发的工具的每次测量成本将不到现有竞争对手扫描电子显微镜或原子力显微镜技术的十二分之一。***

*** 9761534 Marx Sight Systems Inc. will develop a low cost, high speed critical dimension measurement tool for 0.18 m features in the IC and data storage industry. This tool takes advantage of an optical technique developed at the California Institute of Technology, that exploits the polarization properties of light diffracted by a subwavelength-sized structure. The cost per measurement of the tool developed will be less than one twelfth that of existing, competing SEM or AFM technologies. ***