Real Time Polarimetry for Tailored Silicon Thin Films

9820170柯林斯提出的研究将推进薄膜成核和生长的实时分析技术。基于偏振测量的功能强大的高速光学探头将被开发出来，以实现对从亚单层分辨率的生长薄膜表面反射的光的偏振态的全面表征。新方法将产生1)反射光束的斯托克斯矢量在32毫秒内从1.5 eV到6.5 eV，或2)样品在类似能量范围内的米勒矩阵的16个元素在大约200毫秒内。有了这样的能力，将有可能更好地了解氮化硅和氮化硼薄膜的生长，特别是在整个技术上重要的沉积制度中，在这些制度下，薄膜的形态或晶相随着厚度的变化而演变，从而导致各向异性和去极化效应。这些方法将指导新的和改进的薄膜材料的制备，用于未来一代大面积电子和硬涂层。材料制备过程的技术转让预计将导致硅薄膜电池和氮化硼硬质涂层技术的改进。这项拟议的研究将帮助培养在凝聚态、材料和光学物理方面具有广泛技能的研究生和本科生，这些技能需要在工业研究和开发实验室的研究生就业。在这个项目中，首席研究员将开发新的技术，在各种衬底上生长改进的薄膜。新的方法将被转移到从事各种技术应用的薄膜商业生产的美国行业。这项研究将吸引研究生和本科生，他们将接受方法和技术的培训，这些方法和技术将在21世纪的美国技术中发挥重要作用*

9820170CollinsThe proposed research will advance techniques for real time analysis of thin film nucleation and growth. Powerful high-speed optical probes based on polarimetry will be developed to enable full characterization of the polarization state of light reflected from the surfaces of growing films with sub-monolayer resolution. The new methods will yield 1) the Stokes vector of the reflected light beam from 1.5 to 6.5 eV in 32 msec, or 2) the 16 elements of the Mueller matrix of the sample over a similar energy range in approximately 200 msec. With such capabilities, a better understanding of the growth of silicon and boron nitride thin films will be possible, particularly throughout the technologically important deposition regimes in which the morphology or crystalline phase of the films evolves with thickness leading to anisotropy and depolarization effects. These methods will guide the fabrication of new and improved thin film materials for use in future generation of large area electronics and hard coatings. Technology transfer of the process of materials preparation is expected to lead in improvements in silicon thin film voltaics and boron nitride hard coatings technologies. The proposed research will serve to train graduate and undergraduate students with broad skills in condensed matter, materials, and optical physics that are in demand for post-graduate employment in industrial research and development laboratories.%%%In this project the principal investigator will develop new techniques for the preparation of improved thin films during their growth on a variety of substrates. The new methods will be transferable to U.S. industries engaged in the commercial production of thin films for a variety of technological applications. The research will engage graduate and undergraduate students who will be trained in methods and techniques which will be important in U.S. technology in the 21st Century ***