Investigations of Chemical Mechanical Polishing

这是一项探索性研究项目，旨在扩大工程摩擦学产学研合作研究中心。这个联合项目涉及与化学机械抛光相关的基本问题的研究。特别是，该研究将发展“软”和“硬”表面之间的基本关系，在界面上存在被困流体。研究了磨粒尺寸、力学性能和几何位置，以及多衬垫结构对抛光特性的影响。该研究将为抛光和抛光机械的发展提供新的策略。

ABSTRACTEEC-9872592Keer/NW This is an Exploratory Research Project to augment the Industry/University Cooperative Research Center for Engineering Tribology.This joint project involves a study of the fundamental issues associated with chemical mechanical polishing. In particular, the research will develop fundamental relationships between a 'soft' and a 'hard' surface in the presence of fluids trapped at the interface. To be studied are asperity size, mechanical properties and geometric placement, and the influence of multiple pad liners structures on polishing characteristics. The research should lead to new strategies for polishing and for the development of polishing machines.