NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
批准号:
0078406
负责人:
Jeffrey Hopwood
金额:
$17.18万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-09-01 至 2004-08-31
中文摘要
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英文摘要
This NSF/DOE collaborative research project between researchers at Michigan State University and Northeastern University will investigate and establish the scientific basis and engineering principles for the design and operation of small microwave plasma sources with discharge dimensions ranging from 0.3-10 mm. Small microwave discharges operate with low input power, while having very high power densities and highly reactive species outputs. The availability of physically compact microwave power sources built for mobile communication systems combined with small microwave plasma sources opens the possibility of many unique microwave plasma applications. The proposed research will experimentally evaluate and theoretically model the behavior of very small microwave discharges, i.e. millimeter and submillimeter size discharges. Two microwave plasma systems will be used including a highly flexible and adjustable testbed plasma source and a micromachined, microstrip line-based plasma source. The research methodology is to study, using experimental diagnostics and electromagnetic/plasma simulation models, discharges with diameters ranging from 10 mm to 0.3 mm in the testbed plasma source. Then, this testbed source knowledge will be used to design, build and test micromachined, microstrip line based plasma sources. Some of the possible applications include plasma sources for MEMS-scale chemical analysis, micro-thrusters for spacecraft, miniature electrodeless light sources, and miniature sources for spatially focused, plasma-assisted chemical vapor deposition. This project will demonstrate two applications including diamond deposition on small substrate areas and micro-plasmas for portable, low temperature sterilization.
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会议论文
Nanoparticle Detection Using Microplasma
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批准号:0755761
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项目类别:Standard Grant
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资助金额:$24.74万
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财政年份:2008
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负责人:Jeffrey Hopwood
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依托单位:
NER: Airborne Nanoparticle Detector Based on a Microplasma Particle Trap
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批准号:0403460
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2004
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负责人:Jeffrey Hopwood
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依托单位:
The Plasma Physics of Metal-Nitride Deposition of IntegratedCircuit Barrier Layers using Ionized Physical Vapor Deposition
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批准号:9712988
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项目类别:Continuing Grant
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资助金额:$27.0万
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财政年份:1997
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负责人:Jeffrey Hopwood
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依托单位:
CAREER: Research and Education Program Based on a Novel Microplasma Source
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批准号:9701916
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项目类别:Standard Grant
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资助金额:$19.97万
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财政年份:1997
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负责人:Jeffrey Hopwood
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依托单位:
国内基金
海外基金
集成DOE的激光熔覆工艺及先进镍基高温合金熔覆质量控制机理研究
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批准号:51675303
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项目类别:面上项目
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资助金额:62.0万元
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批准年份:2016
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负责人:常保华
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依托单位: