Planning Grant for I/UCRC of Thermal Processing Technology

I/UCRC 热处理技术规划补助金

• 批准号: 0084648
• 负责人: Philip Nash
• 金额: $ 1万
• 依托单位: Illinois Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-08-15 至 2001-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0084648&HistoricalAwards=false
• 关键词: Planning; Grant; UCRC; Thermal; Processing

Thermal processing is a fundamental part of almost all materials manufacturing processes. Thermal processing encompasses a broad range of processes in which heating or cooling are used and during which process the material may undergo some change in internal structure and/or external geometry. The thermal processing industry faces a number of challenges to continued growth and international competitiveness as outlined in a technology road map for the industry, "The 1999 R&D Plan for Heat Treating" published by the Heat Treat Society. This planning grant is to support activities aimed at determining the feasibility of establishing an I/UCRC focused on thermal processing technology. The activities will culminate in a planning meeting with industry to develop a research agenda and commitments for membership.

热处理是几乎所有材料制造工艺的基本组成部分。 热处理包括广泛的工艺，其中使用加热或冷却，并且在该工艺期间，材料可能经历内部结构和/或外部几何形状的一些变化。 热处理行业面临着持续增长和国际竞争力的挑战，如热处理协会发布的行业技术路线图“1999年热处理研发计划”所述。 该规划补助金用于支持旨在确定建立以热处理技术为重点的I/UCRC的可行性的活动。 这些活动的高潮将是与工业界举行一次规划会议，以制定研究议程和成员承诺。