SBIR Phase I: Photonic Crystal Defect Cavity Enhanced Photodetector
SBIR Phase I: Photonic Crystal Defect Cavity Enhanced Photodetector
批准号:
0109578
负责人:
Hongwei Xu
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-07-01 至 2001-12-31
中文摘要
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英文摘要
This Small Business Innovative Research (SBIR) Phase I project will develop a novel photonic crystal defect cavity enhanced photodetector with wavelength selectivity, fast response speed, and low noise. By introducing photonic crystals into the design of a cavity enhanced photodetector, the problems associated with lattice matched reflector growth, low refractive index contrast, and heterojunction charge accumulation will be avoided. The photonic crystal defect cavity enhanced photodetector will be easy to fabricate and have superior performance compared with traditional detectors. The design can be expanded to photodetector arrays in many materials systems. Phase I will investigate the fabrication of photonic crystal defect cavity, characterize the photonic crystal band structure, and test p-i -n photodetector structures. Phase II would produce the prototype photodetector devices and optimize their performance. Novel products utilizing a photonic crystal defect cavity enhanced photodetector are anticipated in optical communications and telecommunications. Since silicon (Si)-based photodetectors can be easily incorporated into Si-based integrated circuits, there will be immediate commercial application to the telecommunications industry. There is also long term potential application in imaging and optical communications.
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SBIR Phase I: Microlaser Array
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批准号:0060522
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2001
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负责人:Hongwei Xu
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依托单位:
国内基金
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