Evaporation and Fluid Flow in Thin Film Regions

薄膜区域的蒸发和流体流动

• 批准号: 0223120
• 负责人: Hongbin Ma
• 金额: $ 7.1万
• 依托单位: University of Missouri-Columbia
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-09-01 至 2004-02-29
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0223120&HistoricalAwards=false
• 关键词: Evaporation; Fluid; Flow; Thin; Film

The proposal is for an experimental and analytical investigation to improve the understanding of evaporation mechanisms and the effects of individual forces on fluid flow and heat transfer in thin films under high heat flux conditions. The PI will develop an analytical model for thin film evaporation that includes thermocapillary force, surface tension, friction, wetting, and disjoining pressure. He will also develop an experimental system to measure film thickness, interface velocity and film profile under high heat flux conditions. The effects of electrostatic fields on the disjoining pressure and the effects of surface microstructures on the thin film evaporation will also be addressed. The results would help advance applications in a variety of emerging technologies in which microchannel evaporative flows occur.

建议进行实验和分析研究，以提高对蒸发机制的理解，以及在高热流密度条件下各力对薄膜中流体流动和换热的影响。PI将开发一个薄膜蒸发的分析模型，该模型包括热毛细管力、表面张力、摩擦、润湿和分离压力。他还将开发一种实验系统，在高热流条件下测量薄膜厚度、界面速度和薄膜轮廓。还讨论了静电场对分离压力的影响以及表面微结构对薄膜蒸发的影响。这一结果将有助于推进在发生微通道蒸发流动的各种新兴技术中的应用。