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NER: Generic Production of Nanoparticles in Plasma Microreactors

NER: Generic Production of Nanoparticles in Plasma Microreactors
NER:等离子体微反应器中纳米颗粒的通用生产
批准号:
0404353
负责人:
Konstantinos Giapis
金额:
$13.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-07-01 至 2005-12-31

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中文摘要
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英文摘要
Generic Production of Nanoparticles in Plasma MicroreactorsThis project focuses on using atmospheric plasma micro-reactors for the generic production of semiconductor and metal nanoparticles from gaseous precursors. Size control is accomplished by residence time in the reducing-conditions reaction zone while simultaneously limiting coagulation by particle charging in the micro-plasma. Narrowly-distributed nano-particles in the 1-3nm size regime are produced, and their optoelectronic and magnetic properties are characterized. Oppositely-charged nano-particles of dissimilar materials are combined to form particle pairs with novel properties. The new synthesis technique is simple, inexpensive, and yet it produces high quality nanoparticles. It offers easy access to a variety of materials at the nanoscale with novel optical, electrical, and magnetic properties. For example, Si nanoparticles can be made to produce red, green, or blue light, promising integration with silicon electronics to increase communication speeds. Also, nanoparticles with different properties may be combined to produce nanomaterials capable of self-assembly with added functionality, for example, magnetic-luminescent particle pairs.
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Plasma-Surface Interactions at Low Ion Energies
  • 批准号:
    1202567
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $39.29万
  • 财政年份:
    2012
  • 负责人:
    Konstantinos Giapis
  • 依托单位:
Quantifying Plasma-Surface Interactions: Charge Exchange, Energy Losses, Fragmentation, and Reactions
  • 批准号:
    0613981
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2006
  • 负责人:
    Konstantinos Giapis
  • 依托单位:
NER: Selective Growth of Nanoparticles at Exposed Carbon Nanotube Tips
  • 批准号:
    0508096
  • 项目类别:
    Standard Grant
  • 资助金额:
    $10.0万
  • 财政年份:
    2005
  • 负责人:
    Konstantinos Giapis
  • 依托单位:
Etching of Dielectrics: Fundamental Plasma-Surface Interactions Through Mass-Filtered, Energy-Tuned Ion Beams
  • 批准号:
    0317397
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $45.0万
  • 财政年份:
    2003
  • 负责人:
    Konstantinos Giapis
  • 依托单位:
海外基金