Plasma-Surface Interactions at Low Ion Energies

低离子能量下的等离子体-表面相互作用

• 批准号: 1202567
• 负责人: Konstantinos Giapis
• 金额: $ 39.29万
• 依托单位: California Institute of Technology
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-10-01 至 2017-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1202567&HistoricalAwards=false
• 关键词: Plasma; Surface; Interactions; Low; Ion

Plasmas are gas-phase assemblies of ions, electrons, and neutral molecules/atoms. When materials surfaces are exposed to plasmas, many complex physical and chemical interactions take place. In particular, energetic ions can dislodge violently, interact electronically, or form chemical bonds with surface atoms. The formation and breakage of chemical bonds (reactions) between energetic gas-phase ions and surfaces are very poorly understood. This research is focused in improving the understanding of such reaction mechanisms and controlling the outcome of plasma-surface interactions. The experimental results will stimulate the development and testing of relevant theories, and introduce new knowledge on reactive scattering dynamics into chemical curricula.Findings from this research should impact surface science and plasma processing, important technologies for characterizing and treating, coating, or etching solid surfaces for applications ranging from surface functionalization, to microelectronics fabrication, and space exploration. The research should lead to a new paradigm for selecting plasma chemistries and conditions, based on the reactivity and overall scattering dynamics of specific ions formed in the plasma, thus speeding up and making less expensive the development of plasma processes for many applications.

等离子体是离子、电子和中性分子/原子的气相组合。当材料表面暴露在等离子体中时，会发生许多复杂的物理和化学相互作用。特别是，高能离子可以猛烈地移动，电子相互作用，或与表面原子形成化学键。高能气相离子和表面之间化学键（反应）的形成和断裂，人们了解得很少。本研究的重点是提高对这种反应机制的理解和控制等离子体表面相互作用的结果。实验结果将促进相关理论的发展和验证，并将反应散射动力学的新知识引入化学课程。这项研究的发现将影响表面科学和等离子体处理，以及表征和处理、涂层或蚀刻固体表面的重要技术，应用范围从表面功能化到微电子制造和空间探索。这项研究将为选择等离子体化学和条件提供一个新的范例，基于等离子体中形成的特定离子的反应性和总体散射动力学，从而加速和降低许多应用的等离子体工艺的开发成本。