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SBIR Phase I: Production of Silicon Nanoparticles by Electrochemical Etching of Silicon Wafers

SBIR Phase I: Production of Silicon Nanoparticles by Electrochemical Etching of Silicon Wafers
SBIR 第一阶段:通过硅片电化学蚀刻生产硅纳米颗粒
批准号:
0539775
负责人:
Yuri Didenko
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2006
资助国家:
美国
项目状态:
已结题
起止时间:
2006-01-01 至 2006-03-31

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中文摘要
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英文摘要
This Small Business Innovation Research (SBIR) Phase I project will focus on the development of new and inexpensive techniques for production of highly fluorescent semiconductor siliconnanoparticles (quantum dots). Preliminary results indicate that lateral etching of silicon wafers can be used for the continuous production of high quality, inexpensive silicon nanoparticles. This Phase 1 program is intended to demonstrate that through optimization of the manufacturing process, a greater yield of particles will meet the larger quantities required by prospective customers. Several industrial companies have expressed an interest in the particles, but require much larger quantities than can be produced in the existing system. By optimizing the technical and chemical aspects of the existing particle system, the project will increase the yield to meet customer demand, and also evaluate the system's reproducibility and scalability. Commercially, this project will provide a basis for scaling up of luminescent silicon quantum dots production. It will allow for production of fluorescent silicon quantum dots and will play significant role in the market of nanomaterials, particularly for photonics devices. It is expected that, in general, the outcome of this proposal will have great impact on future nanotechnology. The reason is that silicon nanoparticles are among the most desired materials for future nanotechnology and research. It will not only have great impact on technology since it will provide a great amount of material for new tools; devices etc. but it also will have great effect on our understanding of silicon properties at small dimensions.
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