SBIR Phase I: Production of Silicon Nanoparticles by Electrochemical Etching of Silicon Wafers

SBIR 第一阶段：通过硅片电化学蚀刻生产硅纳米颗粒

• 批准号: 0617006
• 负责人: Yuri Didenko
• 金额: $ 3.33万
• 依托单位: UT Dots, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-01-12 至 2006-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0617006&HistoricalAwards=false
• 关键词: SBIR; Phase; Production; Silicon; Nanoparticles

This Small Business Innovation Research (SBIR) Phase I project will focus on the development of new and inexpensive techniques for production of highly fluorescent semiconductor siliconnanoparticles (quantum dots). Preliminary results indicate that lateral etching of silicon wafers can be used for the continuous production of high quality, inexpensive silicon nanoparticles. This Phase 1 program is intended to demonstrate that through optimization of the manufacturing process, a greater yield of particles will meet the larger quantities required by prospective customers. Several industrial companies have expressed an interest in the particles, but require much larger quantities than can be produced in the existing system. By optimizing the technical and chemical aspects of the existing particle system, the project will increase the yield to meet customer demand, and also evaluate the system's reproducibility and scalability. Commercially, this project will provide a basis for scaling up of luminescent silicon quantum dots production. It will allow for production of fluorescent silicon quantum dots and will play significant role in the market of nanomaterials, particularly for photonics devices. It is expected that, in general, the outcome of this proposal will have great impact on future nanotechnology. The reason is that silicon nanoparticles are among the most desired materials for future nanotechnology and research. It will not only have great impact on technology since it will provide a great amount of material for new tools; devices etc. but it also will have great effect on our understanding of silicon properties at small dimensions.

该小型企业创新研究（SBIR）第一阶段项目将专注于开发用于生产高荧光半导体硅纳米颗粒（量子点）的新的廉价技术。初步结果表明，硅晶片的横向蚀刻可用于连续生产高质量、廉价的硅纳米颗粒。该第1阶段计划旨在证明，通过优化生产工艺，更大的颗粒产量将满足潜在客户的更大数量需求。几家工业公司已经表达了对颗粒的兴趣，但需要比现有系统中可以生产的数量大得多的数量。通过优化现有颗粒系统的技术和化学方面，该项目将提高产量以满足客户需求，并评估系统的可重复性和可扩展性。在商业上，该项目将为扩大发光硅量子点的生产提供基础。它将允许生产荧光硅量子点，并将在纳米材料市场，特别是光子器件市场中发挥重要作用。总体而言，预计该提案的结果将对未来的纳米技术产生重大影响。原因是硅纳米颗粒是未来纳米技术和研究最理想的材料之一。它不仅将对技术产生巨大影响，因为它将为新工具提供大量材料;设备等，但它也将对我们理解小尺寸硅特性产生巨大影响。