SGER: Constructing a femtosecond sub-10nm resolution photo-thermal imaging system using extreme ultraviolet (EUV) to study nanoscale thermal transport

项目编号：cts -0635579项目负责人：杨荣贵合作单位：美国科罗拉多大学摘要：为了更好地为信息技术、能源技术和生物医学应用等诸多使能技术设计纳米结构，迫切需要同时研究纳米和超快尺度上的能量传输过程。目前还不存在允许超快速和超高分辨率成像的工具。为了应对这一挑战，并为科学界带来纳米技术发展的新表征工具，PI杨荣贵和共同PI Margaret Murnane将合作开发一种高时间和高空间分辨率的光热成像系统，该系统使用高能和短波飞秒（fs） EUV激光，该激光由美国国家科学基金会资助的科罗拉多大学EUV ERC开发。如果成功，该项目开发的光热成像系统具有10fs的时间分辨率和10nm以下的空间分辨率，将作为研究新型纳米结构材料和器件的热生成和输运的表征工具。这样的平台将有助于未来几代纳米材料和器件的设计。由于获得高能极紫外光源的机会有限，传热界对极紫外光的了解很少。在这个项目中实现的合作将有助于通过传播结果向热科学界通报EUV光源的最新进展。此外，该合作将有助于培训几名年轻的研究生和本科生研究助理，以解决EUV光刻中的热挑战。

ABSTRACTProposal Number: CTS-0635579Principal Investigator: Yang, RongguiAffiliation: University of ColoradoProposal Title: SGER: Constructing a femtosecond sub-10nm resolution photo-thermal imaging system using extreme ultraviolet (EUV) to study nanoscale thermal transportAbstract:To better engineer nanostructures for the many enabling technologies such as information technology, energy technology, and bio-medical applications, there is a strong need to study the energy transport processes on the nano and ultrafast scales simultaneously. Tools allowing both ultra fast and ultra high resolution imaging do not currently exist. To address this challenge and to bring to the scientific community a new characterization tool for nanotechnology development, the PI Ronggui Yang and the co-PI Margaret Murnane will collaborate to develop a high temporal and high spatial resolution photo-thermal imaging system using high energy and short wavelength femtosecond (fs) EUV laser developed in the NSF sponsored EUV ERC at The University of Colorado. If successful, the photo-thermal imaging system developed in this project which has a temporal resolution of 10fs and a sub-10nm spatial resolution will serve as a characterization tool for studying the heat generation and transport in novel nanostructured materials and devices. Such an enabling platform will facilitate the design for future generations of nanoscale materials and devices. Due to the limited access to high energy EUV light sources, very little knowledge on EUV has been available to the heat transfer community. The collaboration enabled in this project will help to inform the thermal science community to recent progress on EUV light sources through dissemination of results. The collaboration will in addition help to train several young graduate and undergraduate research assistants to address thermal challenges in EUV lithography.