SGER: Constructing a femtosecond sub-10nm resolution photo-thermal imaging system using extreme ultraviolet (EUV) to study nanoscale thermal transport

命题编号：CTS-0635579主要研究员：杨荣贵隶属于美国科罗拉多大学命题：SGER：利用极紫外线(EUV)构建飞秒亚10 nm分辨率光热成像系统以研究纳米尺度的热传输摘要：为了更好地设计纳米结构以支持信息技术、能源技术和生物医学应用等多种使能技术，迫切需要同时研究纳米和超快尺度上的能量传输过程。目前还不存在同时允许超快和超高分辨率成像的工具。为了应对这一挑战，并为科学界带来一种新的纳米技术开发表征工具，皮荣贵·杨和合作者皮玛格丽特·穆尔纳内将合作开发一种高时间和高空间分辨率的光热成像系统，该系统使用由美国国家科学基金会赞助的科罗拉多大学EUV ERC开发的高能量和短波长飞秒EUV激光器。如果成功，本项目中开发的时间分辨率为10fs，空间分辨率为10 nm以下的光热成像系统将成为研究新型纳米材料和器件中热产生和传输的表征工具。这样一个有利的平台将为未来几代纳米材料和设备的设计提供便利。由于获得高能EUV光源的途径有限，传热界对EUV的了解很少。在该项目中开展的合作将有助于通过传播结果，向热科学界通报在EUV光源方面的最新进展。此外，合作还将帮助培训几名年轻的研究生和本科生研究助理，以应对极紫外光刻技术中的热挑战。

ABSTRACTProposal Number: CTS-0635579Principal Investigator: Yang, RongguiAffiliation: University of ColoradoProposal Title: SGER: Constructing a femtosecond sub-10nm resolution photo-thermal imaging system using extreme ultraviolet (EUV) to study nanoscale thermal transportAbstract:To better engineer nanostructures for the many enabling technologies such as information technology, energy technology, and bio-medical applications, there is a strong need to study the energy transport processes on the nano and ultrafast scales simultaneously. Tools allowing both ultra fast and ultra high resolution imaging do not currently exist. To address this challenge and to bring to the scientific community a new characterization tool for nanotechnology development, the PI Ronggui Yang and the co-PI Margaret Murnane will collaborate to develop a high temporal and high spatial resolution photo-thermal imaging system using high energy and short wavelength femtosecond (fs) EUV laser developed in the NSF sponsored EUV ERC at The University of Colorado. If successful, the photo-thermal imaging system developed in this project which has a temporal resolution of 10fs and a sub-10nm spatial resolution will serve as a characterization tool for studying the heat generation and transport in novel nanostructured materials and devices. Such an enabling platform will facilitate the design for future generations of nanoscale materials and devices. Due to the limited access to high energy EUV light sources, very little knowledge on EUV has been available to the heat transfer community. The collaboration enabled in this project will help to inform the thermal science community to recent progress on EUV light sources through dissemination of results. The collaboration will in addition help to train several young graduate and undergraduate research assistants to address thermal challenges in EUV lithography.