Mechanisms of resonant IR photodesorption of adsorbates from surfaces

这个合作研究项目涉及来自明尼苏达大学和范德比尔特大学的研究人员团队。利用范德比尔特的自由电子激光设备，他们正在系统地探索氢分子从硅和钻石表面特定模式脱附的机制。分析和表面化学计划的支持使这项合作研究成为可能。了解这种脱附现象的机理影响了我们对化学反应动力学的基本理解，并可能对硅电子器件的生长和加工有一定的指导意义。对脱附过程的系统研究，变化的自由电子激光波长，时间参数和表面条件，加上表面的隧道显微镜检查，正在被用来理清这种不寻常的机制。

This collaborative research project involves a team of researchers from the University of Minnesota and Vanderbilt University. Using the free electron laser facility at Vanderbilt, they are systematically exploring the mechanism of mode specific desorption of hydrogen molecules from silicon and diamond surfaces. Support from the Analytical and Surface Chemistry Program enables this collaborative research. An understanding of the mechanism of this desorption phenomena impacts our fundamental understanding of chemical reaction dynamics, and may have implications for the growth and processing of silicon electronic devices. A systematic study of the desorption process, varying free electron laser wavelength, temporal parameters, and surface conditions, coupled with tunneling microscopy examination of the surface, is being used to sort out this unusual mechanism.