Mechanisms of resonant IR photodesorption of adsorbates from surfaces

表面吸附物的共振红外光解吸机制

• 批准号: 0707044
• 负责人: Norman Tolk
• 金额: $ 22.5万
• 依托单位: Vanderbilt University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2007
• 资助国家: 美国
• 起止时间: 2007-06-15 至 2011-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0707044&HistoricalAwards=false
• 关键词: Mechanisms; resonant; IR; photodesorption; adsorbates

This collaborative research project involves a team of researchers from the University of Minnesota and Vanderbilt University. Using the free electron laser facility at Vanderbilt, they are systematically exploring the mechanism of mode specific desorption of hydrogen molecules from silicon and diamond surfaces. Support from the Analytical and Surface Chemistry Program enables this collaborative research. An understanding of the mechanism of this desorption phenomena impacts our fundamental understanding of chemical reaction dynamics, and may have implications for the growth and processing of silicon electronic devices. A systematic study of the desorption process, varying free electron laser wavelength, temporal parameters, and surface conditions, coupled with tunneling microscopy examination of the surface, is being used to sort out this unusual mechanism.

这项合作研究项目涉及来自明尼苏达大学和范德比尔特大学的一组研究人员。利用范德比尔特大学的自由电子激光设备，他们正在系统地探索氢分子从硅和金刚石表面的模式特异性解吸机制。分析和表面化学项目的支持使这项合作研究成为可能。对这种解吸现象机理的理解影响了我们对化学反应动力学的基本理解，并可能对硅电子器件的生长和加工产生影响。系统地研究了脱附过程，改变了自由电子激光波长、时间参数和表面条件，结合隧道显微镜对表面的检查，正在被用来整理这种不寻常的机制。