MRI: Acquisition of an Ar Ion Laser for Photonic Bandgap Materials Research and Education
MRI:获取用于光子带隙材料研究和教育的 Ar 离子激光器
基本信息
- 批准号:0722754
- 负责人:
- 金额:$ 9.73万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2007
- 资助国家:美国
- 起止时间:2007-09-01 至 2009-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Technical abstract:"In this Major Research Instrumentation Program proposal, the University of Texas-Pan American is requesting funding to purchase an Ar ion laser system for the fabrication of three dimensional photonic band-gap materials (photonic crystals). The Ar ion laser can provide up to eight laser lines in the visible range needed for the nano/micro-structuring of photosensitive materials. The fabrication of the photonic crystal is based on the laser phase mask lithography technique, which provides a highly efficient approach, of unprecedented simplicity, for the mass production of large-scale three-dimensional photonic band-gap materials. Further photonic crystals will be functionalized as optical circuits by adding optical waveguides and resonators using two-photon lithography. University of Texas-Pan American is a minority-serving university, which is second in the nation in the number of bachelor's degrees awarded to Hispanics. The supported research will foster their desire to pursue advanced degrees, increasing the number of under-represented scientists."Non-technical abstract:"In this Major Research Instrumentation Program proposal, the University of Texas-Pan American is requesting funding to purchase a very strong light beam called laser in the visible range. The laser will be used to fabricate optical materials with a feature size 100 times smaller than a human hair. The small structure in the optical material can manipulate (control) photons as silicon material did to electrons (so the optical material is also called photonic crystal). These optical materials will be used to fabricate optical chip (similar to computer chip) by adding light path and enhancing the light inside. The fabrication is based on a mask technique. When the laser beam goes through the mask, it will produce a dark and bright pattern behind the mask. Photosensitive materials will record such pattern. When it is developed in chemical solution, the structure with very small feature is formed in the material. The mask technique is much simpler than other methods. It will significantly reduce the fabrication cost from $500,000 down to $100,000 (cost of laser). The proposed research can make optical circuit manufacturing commercially feasible and contribute to the United States' global competitiveness in photonics technology. University of Texas-Pan American is a minority-serving university, which is second in the nation in the number of bachelor's degrees awarded to Hispanics. The supported research will foster their desire to pursue advanced degrees, increasing the number of under-represented scientists.
技术摘要:“在这项重大研究仪器计划提案中,德克萨斯大学泛美分校正在申请资金购买用于制造三维光子带隙材料(光子晶体)的Ar离子激光系统。 Ar离子激光器可以在可见光范围内提供多达8条激光线,用于光敏材料的纳米/微米结构化。光子晶体的制作是基于激光相位掩模光刻技术,它提供了一个高效的方法,前所未有的简单,大规模生产的三维光子带隙材料。进一步的光子晶体将通过使用双光子光刻添加光波导和谐振器来功能化为光学电路。得克萨斯大学泛美分校是一所少数民族服务大学,在授予西班牙裔学士学位的数量上位居全国第二。支持的研究将促进他们追求高级学位的愿望,增加代表性不足的科学家的数量。“非技术摘要:”在这项重大研究仪器计划提案中,德克萨斯大学泛美分校正在请求资金购买一种在可见光范围内称为激光的非常强的光束。该激光将用于制造特征尺寸比人类头发小100倍的光学材料。光学材料中的小结构可以操纵(控制)光子,就像硅材料操纵电子一样(因此光学材料也称为光子晶体)。这些光学材料将用于制造光学芯片(类似于计算机芯片),通过增加光路和增强内部的光。制造是基于掩模技术。当激光束穿过掩模时,会在掩模后面产生明暗相间的图案。感光材料会记录这种图案。当它在化学溶液中显影时,在材料中形成具有非常小特征的结构。掩模技术比其他方法简单得多。这将使制造成本从500,000美元大幅降低到100,000美元(激光成本)。这项研究可以使光电路制造在商业上可行,并有助于提高美国在光子技术方面的全球竞争力。得克萨斯大学泛美分校是一所少数民族服务大学,在授予西班牙裔学士学位的数量上位居全国第二。支持的研究将促进他们追求高级学位的愿望,增加代表性不足的科学家的数量。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Yuankun Lin其他文献
High-pressure Raman spectra of lithium triborate crystal and pressure-induced phase transitions
三硼酸锂晶体的高压拉曼光谱和压力诱导的相变
- DOI:
10.1016/0022-3697(94)90191-0 - 发表时间:
1994 - 期刊:
- 影响因子:4
- 作者:
Yuankun Lin;Guisheng Xiong;G. Lan;Huafu Wang;Liwen Xu - 通讯作者:
Liwen Xu
Resonant Raman scattering and electron-phonon coupling in the organic superconductor (BEDT-TTF)2[Cu(NCS)2]
有机超导体中的共振拉曼散射和电子声子耦合 (BEDT-TTF)2[Cu(NCS)2]
- DOI:
10.1016/s0379-6779(97)81030-2 - 发表时间:
1997 - 期刊:
- 影响因子:0
- 作者:
J. Eldridge;Y. Xie;Yuankun Lin;H. H. Wang;J. Williams;J. Schlueter - 通讯作者:
J. Schlueter
Polarization sensitive near-complete reflection from photonic crystal slab in centered rectangular lattice
中心矩形晶格中光子晶体板的偏振敏感近全反射
- DOI:
10.1063/1.3610518 - 发表时间:
2011 - 期刊:
- 影响因子:3.2
- 作者:
Simon Padron;Kris Ohlinger;K. Lozano;Yuankun Lin - 通讯作者:
Yuankun Lin
Design and fabrication of local fill fraction in photonic crystal templates using a spatial light modulator
使用空间光调制器设计和制造光子晶体模板中的局部填充分数
- DOI:
- 发表时间:
2016 - 期刊:
- 影响因子:0
- 作者:
Jeffrey Lutkenhaus;D. George;David Lowell;Hualiang Zhang;Yuankun Lin - 通讯作者:
Yuankun Lin
Flexible Holographic Fabrication of 3D Photonic Crystal Templates with Polarization Control through a 3D Printed Reflective Optical Element
通过 3D 打印反射光学元件实现偏振控制的 3D 光子晶体模板的灵活全息制造
- DOI:
- 发表时间:
2016 - 期刊:
- 影响因子:3.4
- 作者:
David Lowell;D. George;Jeffrey Lutkenhaus;C. Tian;M. Adewole;U. Philipose;Hualiang Zhang;Yuankun Lin - 通讯作者:
Yuankun Lin
Yuankun Lin的其他文献
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{{ truncateString('Yuankun Lin', 18)}}的其他基金
Collaborative Research: Three-Dimensional Laser Holographic Nanopatterning Using Metamaterial Phase Masks
合作研究:使用超材料相位掩模的三维激光全息纳米图案
- 批准号:
1661842 - 财政年份:2017
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
Collaborative Research: Digitally Addressable and Scalable Laser Fabrication of 3D Gradient Index Nanostructures and Nanophotonic Circuits
合作研究:3D 梯度折射率纳米结构和纳米光子电路的数字可寻址和可扩展激光制造
- 批准号:
1266251 - 财政年份:2013
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
NIRT: 3D Hierarchical Nanomanufacturing for Active Photonics-on-chip
NIRT:用于主动片上光子学的 3D 分层纳米制造
- 批准号:
1115903 - 财政年份:2010
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
Collaborative Research: Laser Manufacturing of Three-Dimensional Lightwave Circuits and Nano-Optical Devices
合作研究:三维光波电路和纳米光学器件的激光制造
- 批准号:
1109971 - 财政年份:2010
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
Collaborative Research: Laser Manufacturing of Three-Dimensional Lightwave Circuits and Nano-Optical Devices
合作研究:三维光波电路和纳米光学器件的激光制造
- 批准号:
0900458 - 财政年份:2009
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
NIRT: 3D Hierarchical Nanomanufacturing for Active Photonics-on-chip
NIRT:用于主动片上光子学的 3D 分层纳米制造
- 批准号:
0609345 - 财政年份:2006
- 资助金额:
$ 9.73万 - 项目类别:
Standard Grant
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