SBIR Phase I: High Power Pulsed Fiber Laser for EUV Lithography

SBIR 第一阶段：用于 EUV 光刻的高功率脉冲光纤激光器

• 批准号: 0945648
• 负责人: Thomas Sosnowski
• 金额: --
• 依托单位: Arbor Photonics
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-01-01 至 2011-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0945648&HistoricalAwards=false
• 关键词: SBIR; Phase; Power; Pulsed; Fiber

This Small Business Innovation Research Phase I project will establish the feasibility of a power scalable, short pulse fiber laser that is suitable for use in Extreme UV Lithography (EUVL). A power scalable solution is proposed here, based on fiber lasers using Chirally-Coupled Core (3C) fiber that is 3X more energy efficient and dramatically more compact than competing alternatives. 3C fiber enables single-mode optical output from fibers with core diameters much larger than conventional double-clad fiber.Successful completion of this project would provide a technology to extend photolithography for feature sizes below 22 nanometers. Currently available laser technology can deliver only one third of the power required for high volume manufacturing by EUVL. Source laser power scaling is a key enabler for high volume manufacturing with EUVL and hence the production of semiconductor integrated circuits (ICs) that are smaller, more powerful and more energyefficient.

该小型企业创新研究第一阶段项目将建立适用于极紫外光刻 (EUVL) 的功率可扩展、短脉冲光纤激光器的可行性。 这里提出了一种功率可扩展的解决方案，该解决方案基于使用手性耦合芯 (3C) 光纤的光纤激光器，该解决方案的能源效率比竞争替代方案高 3 倍，而且结构更加紧凑。 3C光纤可实现纤芯直径比传统双包层光纤大得多的光纤的单模光输出。该项目的成功完成将提供一种将光刻技术扩展到22纳米以下特征尺寸的技术。目前可用的激光技术只能提供 EUVL 大批量制造所需功率的三分之一。源激光功率缩放是 EUVL 大批量制造的关键推动因素，因此可以生产更小、更强大、更节能的半导体集成电路 (IC)。