SBIR Phase I: Development of Chemical Vapor Deposition of Shape Memory Alloy TiNi Thin Films for Complex Forms

SBIR 第一阶段：复杂形状形状记忆合金 TiNi 薄膜化学气相沉积的开发

• 批准号: 1014097
• 负责人: Peter Jardine
• 金额: $ 15万
• 依托单位: Shape Change Technologies
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-07-01 至 2010-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1014097&HistoricalAwards=false
• 关键词: SBIR; Phase; Development; Chemical; Vapor

This Small Business Innovation Research (SBIR) Phase I project seeks to develop an new methodology for the deposition of large-scale uniform and complex shape memory alloy parts. Current deposition methods cannot generate the uniform chemical composition, or the three dimensional geometric complexity, that is required for commercially relevant parts. In addition, the cost of current methods to manufacture TiNi, a key thin film shape memory alloy, is too high, limiting commercial acceptance. Chemical vapor deposition (CVD) of TiNi offers a means to manufacture geometrically complex parts inexpensively. In Phase I, our team will characterize a novel CVD process and characterize the resultant manufactured parts in terms of chemical composition, chemical uniformity, and contamination levels. This data will enable a transition to manufacturing of commercial shape memory devices in Phase II.The broader impact/commercial potential of this project is the development of a new fabrication methodology that will allow for a dramatic reduction in the cost of thin film TiNi sheet products, stents, and open celled foams, by providing a means to manufacture highly consistent, uniform articles in a batch production process. For highly geometrically complex forms, such as high porosity open celled foams, this CVD process is an enabling manufacturing technology. Successful development of this process will revolutionize the thin film TiNi industry by finally supplying products to the marketplace with the required quality and batch-to-batch consistency for wide commercial acceptance.

该小型企业创新研究（SBIR）第一阶段项目旨在开发一种用于沉积大规模均匀和复杂形状记忆合金零件的新方法。 目前的沉积方法不能产生商业相关部件所需的均匀化学成分或三维几何复杂性。 此外，目前制造TiNi（一种关键的薄膜形状记忆合金）的方法的成本太高，限制了商业接受度。 TiNi的化学气相沉积（CVD）提供了一种廉价制造几何复杂零件的方法。 在第一阶段，我们的团队将表征一种新的CVD工艺，并在化学成分、化学均匀性和污染水平方面表征所制造的零件。 该数据将使过渡到商业形状记忆装置的制造在第二阶段。更广泛的影响/商业潜力，该项目是一种新的制造方法，将允许一个显着降低薄膜TiNi片材产品，支架和开孔泡沫的成本，通过提供一种方法来制造高度一致的，均匀的物品在批量生产过程中的发展。 对于高度几何复杂的形状，例如高孔隙率开孔泡沫，这种CVD工艺是一种可行的制造技术。 该工艺的成功开发将彻底改变薄膜TiNi行业，最终向市场提供具有所需质量和批次间一致性的产品，以获得广泛的商业认可。