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MRI: Acquisition of a mask aligner and a pattern generation system for nanoscale science and device research

MRI: Acquisition of a mask aligner and a pattern generation system for nanoscale science and device research
MRI:采购掩模对准器和图案生成系统,用于纳米级科学和设备研究
批准号:
1040435
负责人:
Tsung-Cheng Shen
金额:
$10.11万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-01-01 至 2013-12-31

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中文摘要
翻译
该方案的目标是获得用于光刻(从毫米到0.6微米尺度)的掩模对准器和用于亚100 nm电子束光刻(EBL)的现有扫描电子显微镜上的纳米图形生成系统。微细加工最初是为硅器件和集成电路开发的,现已成为探索石墨烯和超材料等新材料特性以及创造具有新功能的器件的基本技术,如传感器和纳米/微电子机械系统(N/MEMS)。智能价值与犹他州州立大学S纳米器件实验室的现有设备相结合,这两项新增加的设备将首次在犹他州州立大学实现新材料的表征和为许多跨学科研究项目创造新器件。一旦这些目前正在进行的项目中的设备和能力得到突出显示,预计将有更多的研究人员使用NDL来探索微/纳米级设备的无限世界。广泛影响获得所需的系统将是对USU研究基础设施的重大改进,无疑将有助于USU招收对纳米科学和工程感兴趣的教职员工和学生。在NDL工作的学生,包括代表性不足的群体,将获得宝贵的微制造基础知识培训,使他们能够在国家纳米制造设施更有效地开展研究。NDL已经参与了开放参观和课堂演示,并计划开展更多涉及微制造的活动。NDL将积极建立更多的工业伙伴关系,不仅是为了将成功的原型商业化,也是为了促进以社会需求为重点的研究。
英文摘要
The objective of this proposal is to acquire a mask aligner for photolithography (from mm to 0.6 micrometer scale) and a nanometer pattern generation system to be attached to the existing SEM for sub-100 nm e-beam lithography (EBL). Microfabrication, originally developed for silicon-devices and integrated circuits, has become an essential technology to explore properties of new materials, such as graphene and metamaterials, and create devices with novel functionalities, such as sensors and nano/microelectrical-mechanical-systems (N/MEMS).Intellectual MeritCombined with the existing equipment at Utah State University?s Nanoscale Device Laboratory (NDL), these two additions will enable, for the first time at USU, the characterization of new materials and the creation of novel devices for a number of cross-disciplinary research projects. Once the equipment is set up and capabilities are highlighted from these currently underway projects, it is expected that more researchers will use NDL to explore the unlimited world of micro/nanoscale devices.Broader ImpactsAcquiring the requested system will be a significant research infrastructure improvement for USU and will undoubtedly help USU to recruit faculty and students interested in nanoscale science and engineering. Students, including underrepresented groups, working at NDL will receive invaluable training in the basics of microfabrication allowing them to carry out research more efficiently at national nanofabrication facilities. NDL has been involved in open-house and class-demonstrations, and further activities involving microfabrication are planned. More industrial partnerships will be actively pursued at NDL not only to commercialize successful prototypes but to stimulate research focusing on the needs of society.
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海外基金