Planning Grant: I/UCRC for Novel High Voltage Transmission Materials and Structures

规划补助金：I/UCRC 用于新型高压输电材料和结构

• 批准号: 1238139
• 负责人: Maciej Kumosa
• 金额: $ 1.45万
• 依托单位: University of Denver
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-07-15 至 2013-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1238139&HistoricalAwards=false
• 关键词: Planning; Grant; UCRC; Novel; Voltage

Program Director' Recommendation Planning Grant: I/UCRC for Novel High Voltage Transmission Materials 1238139 University of Denver; Maciej Kumosa 1238275 Michigan Technological University; Gregory Odegard 1238331 University of Illinois at Urbana-Champaign; Iwona Jasiuk The proposed Center, comprised of the University of Denver (UD as the lead institution), Michigan Technological University (MTU) and the University of Illinois at Urbana-Champaign (UIUC), will focus on improving the design of the next generation High Voltage transmission (HV/T) conductors. The current designs of high voltage conductors based on steel (for strength) and aluminum (for conduction) strands used in regional grids exhibit several limitations. Primarily, they are limited by their propensity to sag at elevated temperatures. Through extensive collaborations amongst the sites of the proposed Center and with several leading US industries and national laboratories, entirely new classes of HV/T materials systems and structures will be designed for a variety of high energy applications. The interdisciplinary fundamental and applied research performed in the Center will make a major impact on the understanding of the combined effects of mechanical, electrical and environmental high energy fields on traditional metallic materials, novel polymer, metallic and ceramic matrix composites, highly advanced next generation nanocomposites, coatings, and others. The PIs intend to explore new manufacturing technologies in order to improve the aging resistance of traditional low cost materials for HV/T long term applications. Finally,new monitoring, self-repair and self-healing techniques for HV/T structures will be designed as a result of the proposed research activities of the Center. The proposed research will increase the fundamental knowledge of the effects of HV/T fields on the materials leading to major advances in (1) HV transmission engineering, (2) high energy generation and distribution systems, and (3) many other fields of engineering requiring the application of HV/T material systems. It will also create a diverse and interdisciplinary educational, research and business environment for (1) numerous undergraduate and graduate students, including those from underrepresented groups, funded by the research projects of the Center, (2) faculty members from a variety of disciplines, including junior faculty starting their academic careers, (3) utility, aerospace and national lab engineers and designers developing various types of HV/T materials and structures, (4) utility managers supervising HV transmission lines across the country, and many others. The Center will enhance the reputation of the American HV/T manufacturing around the world and, in particular, will improve the level of confidence among the potential users of novel HV/T structures in this country and around the world.

项目主任推荐计划资助：I/UCRC新型高压输电材料1238139丹佛大学; Maciej Kumosa 1238275密歇根理工大学; Gregory Odegard 1238331伊利诺伊大学厄巴纳-香槟分校; Iwona Jasiuk拟建中心由丹佛大学组成（UD作为牵头机构），密歇根理工大学（MTU）和伊利诺伊大学香槟分校（UIUC）将专注于改进下一代高压输电（HV/T）导体的设计。在区域电网中使用的基于钢（用于强度）和铝（用于传导）绞线的高压导体的当前设计表现出若干限制。首先，它们受到在高温下下垂倾向的限制。通过与拟建中心各地点以及美国几个领先行业和国家实验室的广泛合作，将为各种高能应用设计全新的HV/T材料系统和结构。在该中心进行的跨学科基础和应用研究将对理解机械，电气和环境高能场对传统金属材料，新型聚合物，金属和陶瓷基复合材料，高度先进的下一代纳米复合材料，涂层等的综合影响产生重大影响。PI旨在探索新的制造技术，以提高传统低成本材料的耐老化性，用于HV/T长期应用。最后，作为该中心拟议研究活动的结果，将设计用于HV/T结构的新的监测、自我修复和自我愈合技术。拟议的研究将增加HV/T场对材料影响的基础知识，从而在（1）高压输电工程，（2）高能量发电和配电系统，以及（3）需要应用HV/T材料系统的许多其他工程领域取得重大进展。它还将创造一个多元化和跨学科的教育，研究和商业环境，为（1）众多的本科生和研究生，包括那些来自代表性不足的群体，由该中心的研究项目资助，（2）来自不同学科的教师，包括初级教师开始他们的学术生涯，（3）实用程序，航空航天和国家实验室工程师和设计师开发各种类型的高压/T材料和结构，（4）公用事业管理人员监督全国高压输电线路，以及许多其他人。该中心将提高美国HV/T制造业在世界各地的声誉，特别是将提高美国和世界各地新型HV/T结构潜在用户的信心水平。