EAPSI: Silica Removal from Industrial Waste Water to Facilitate Water Reuse

水资源短缺是当今世界许多地区面临的一个问题。水的再利用减少了对淡水提取的需求，从而缓解了这一问题。然而，二氧化硅结垢是制约回用技术应用的主要因素。集成电路（IC）制造等行业每天排放数百万加仑含有二氧化硅的水。这种大量的水源必须经过净化才能再利用，而这样做的结果是成本高昂且使人衰弱的硅垢。台湾拥有高密度的集成电路制造，是研究工业废水中有效去除二氧化硅的战略位置。台湾新竹国立交通大学副校长黄志平博士将为本研究提供指导。研究将与黄博士以前在二氧化硅去除方面的研究相结合，从而利用他的专业知识和实验室设备。NCTU靠近新竹著名的科技园，将允许从各种IC制造商获得独特和一致的废水。二氧化硅的形态是可变的，在水中以单体（H4SiO4）、聚合（5nm）和胶体（5nm）的形式存在。二氧化硅没有已知的健康影响，但当存在于反渗透（RO），冷却塔和锅炉操作时，会导致工艺阻碍。集成电路（IC）工业产生大量含有胶体二氧化硅的废水。为了使这些水被重复使用，必须通过反渗透净化，而反渗透本身就受到二氧化硅垢的阻碍。台湾拥有高密度的集成电路制造，是研究工业废水中有效去除二氧化硅的战略位置。这项工作将评估吸附、共沉淀和混凝机制对IC废水中二氧化硅的去除效果。研究将在台湾新竹国立交通大学副校长、著名水净化研究员黄志平博士的指导下进行。黄博士以前的研究实施混凝和过滤去除胶体二氧化硅将作为这项工作的基础。变吗?我们靠近新竹众多的集成电路制造商，这将为评估各种二氧化硅废物流提供有利的途径。该奖项隶属于东亚及太平洋暑期研究所项目，由美国国家科学基金会和台湾科技部共同资助，支持美国研究生的暑期研究。

Water shortage is a problem facing many parts of the world today. Water reuse offers relief to this problem by decreasing the need for fresh water withdrawals. However, silica scale is a major inhibiting factor in the application of reuse technology. Industries such as Integrated Circuit (IC) manufacture discharge millions of gallons of water per day with silica content. This substantial water source must be purified before it can be reused, and in doing so, costly and debilitating silica scale results. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. Dr. Chihpin Huang, a distinguished researcher and Vice President of National Chiao Tung University (NCTU) in Hsinchu Taiwan, will provide mentorship for this work. Research will be in conjunction with Dr. Huang's previous studies in silica removal, thereby leveraging his expertise and laboratory equipment. NCTU's close proximity to Hsinchu's renowned technology park will allow unique and consistent access to waste water from a variety of IC manufacturers.Silica speciation is variable and exists as a monomeric (H4SiO4), polymerized (5nm), and colloidal (5nm) constituent in water. Silica presents no known health effects, but leads to process hindering scale when present in reverse osmosis (RO), cooling tower, and boiler operations. The integrated circuit (IC) industry produces copious amounts of waste water containing colloidal silica. In order for this water to be reused, it must be purified by RO, which is inherently hindered by silica scale. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. This work will evaluate adsorption, co-precipitation, and coagulation mechanisms in their effectiveness for silica removal from IC waste water. Research will proceed under the expertise of Dr. Chihpin Huang, distinguished water purification researcher and Vice President of National Chiao Tung University (NCTU) located in Hsinchu, Taiwan. Dr. Huang's previous studies implementing coagulation and filtration for colloidal silica removal will serve as the foundation for this work. NCTU?s close proximity to an abundance of IC manufactures in Hsinchu will provide advantageous access to a variety of silica waste streams for evaluation.This award under the East Asia and Pacific Summer Institutes program supports summer research by a U.S. graduate student and is jointly funded by NSF and the Ministry of Science and Technology of Taiwan.