EAPSI: Silica Removal from Industrial Waste Water to Facilitate Water Reuse

水资源短缺是当今世界许多地区面临的一个问题。水的再利用减少了对淡水提取的需求，从而缓解了这个问题。然而，硅垢是制约回用技术应用的主要因素。集成电路(IC)制造等行业每天排放数百万加仑含有二氧化硅的水。这种重要的水源必须经过净化才能再利用，这样做会产生昂贵的、使人虚弱的硅垢。台湾的IC制造密度很高，是研究工业废水中二氧化硅有效去除的战略要地。台湾新竹国立交通大学(NCTU)副校长、杰出研究员黄志斌博士将为这项工作提供指导。研究将与黄博士之前在二氧化硅去除方面的研究相结合，从而利用他的专业知识和实验室设备。NCTU靠近新竹著名的科技园，将允许以独特和一致的方式获取来自各种IC制造商的废水。硅的形态多种多样，在水中以单体(H4SiO4)、聚合(5 Nm)和胶体(5 Nm)的形式存在。二氧化硅对健康没有已知的影响，但在反渗透(RO)、冷却塔和锅炉运行中会导致工艺阻碍结垢。集成电路(IC)行业产生大量含有胶体二氧化硅的废水。为了使这些水得到再利用，必须用反渗透进行净化，而反渗透本身就会受到硅垢的阻碍。台湾的IC制造密度很高，是研究工业废水中二氧化硅有效去除的战略要地。这项工作将评估吸附、共沉淀和混凝机理对IC废水中二氧化硅的去除效果。研究将在位于台湾新竹的国立交通大学(NCTU)副校长、著名净水研究员黄志斌博士的专业知识下进行。黄博士之前对胶体二氧化硅去除进行混凝和过滤的研究将作为这项工作的基础。S在新竹靠近大量的IC制造商，将提供有利的途径获得各种二氧化硅废流进行评估。该奖项根据东亚和太平洋暑期学院计划支持一名美国研究生的暑期研究，由国家科学基金会和台湾科技部联合资助。

Water shortage is a problem facing many parts of the world today. Water reuse offers relief to this problem by decreasing the need for fresh water withdrawals. However, silica scale is a major inhibiting factor in the application of reuse technology. Industries such as Integrated Circuit (IC) manufacture discharge millions of gallons of water per day with silica content. This substantial water source must be purified before it can be reused, and in doing so, costly and debilitating silica scale results. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. Dr. Chihpin Huang, a distinguished researcher and Vice President of National Chiao Tung University (NCTU) in Hsinchu Taiwan, will provide mentorship for this work. Research will be in conjunction with Dr. Huang's previous studies in silica removal, thereby leveraging his expertise and laboratory equipment. NCTU's close proximity to Hsinchu's renowned technology park will allow unique and consistent access to waste water from a variety of IC manufacturers.Silica speciation is variable and exists as a monomeric (H4SiO4), polymerized (5nm), and colloidal (5nm) constituent in water. Silica presents no known health effects, but leads to process hindering scale when present in reverse osmosis (RO), cooling tower, and boiler operations. The integrated circuit (IC) industry produces copious amounts of waste water containing colloidal silica. In order for this water to be reused, it must be purified by RO, which is inherently hindered by silica scale. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. This work will evaluate adsorption, co-precipitation, and coagulation mechanisms in their effectiveness for silica removal from IC waste water. Research will proceed under the expertise of Dr. Chihpin Huang, distinguished water purification researcher and Vice President of National Chiao Tung University (NCTU) located in Hsinchu, Taiwan. Dr. Huang's previous studies implementing coagulation and filtration for colloidal silica removal will serve as the foundation for this work. NCTU?s close proximity to an abundance of IC manufactures in Hsinchu will provide advantageous access to a variety of silica waste streams for evaluation.This award under the East Asia and Pacific Summer Institutes program supports summer research by a U.S. graduate student and is jointly funded by NSF and the Ministry of Science and Technology of Taiwan.