EAPSI: Silica Removal from Industrial Waste Water to Facilitate Water Reuse

水资源短缺是当今世界许多地区面临的问题。水的再利用通过减少对淡水抽取的需求来缓解这一问题。然而，硅垢是回用技术应用的主要制约因素。诸如集成电路（IC）制造的工业每天排放数百万加仑的含有二氧化硅的水。这种大量的水源必须在其可以再利用之前进行纯化，并且在这样做的过程中，产生昂贵且使人衰弱的二氧化硅垢。台湾有高密度的集成电路制造，并提出了自己作为一个战略位置，研究有效的二氧化硅从工业废水中去除。台湾新竹国立交通大学（NCTU）副校长、杰出研究员黄之滨博士将为这项工作提供指导。研究将与黄博士先前在二氧化硅去除方面的研究相结合，从而利用他的专业知识和实验室设备。NCTU靠近新竹著名的科技园区，这将使各种IC制造商能够获得独特而一致的废水。二氧化硅的形态是可变的，在水中以单体（H4SiO4），聚合（5nm）和胶体（5nm）的成分存在。二氧化硅没有已知的健康影响，但在反渗透（RO），冷却塔和锅炉操作中存在时会导致过程阻碍结垢。集成电路（IC）工业产生大量含有胶体二氧化硅的废水。为了使这些水被重复使用，它必须通过RO净化，这本身就受到硅垢的阻碍。台湾有高密度的集成电路制造，并提出了自己作为一个战略位置，研究有效的二氧化硅从工业废水中去除。这项工作将评估吸附，共沉淀，和混凝机制，其有效性去除硅IC废水。研究将在杰出的水净化研究员和位于台湾新竹的国立交通大学（NCTU）副校长黄治平博士的专业知识下进行。黄博士以前的研究实施混凝和过滤的胶体二氧化硅去除将作为这项工作的基础。反恐组？该奖项是由美国国家科学基金会和台湾科技部联合资助的东亚和太平洋暑期研究所项目下的一个奖项，旨在资助美国研究生的暑期研究。

Water shortage is a problem facing many parts of the world today. Water reuse offers relief to this problem by decreasing the need for fresh water withdrawals. However, silica scale is a major inhibiting factor in the application of reuse technology. Industries such as Integrated Circuit (IC) manufacture discharge millions of gallons of water per day with silica content. This substantial water source must be purified before it can be reused, and in doing so, costly and debilitating silica scale results. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. Dr. Chihpin Huang, a distinguished researcher and Vice President of National Chiao Tung University (NCTU) in Hsinchu Taiwan, will provide mentorship for this work. Research will be in conjunction with Dr. Huang's previous studies in silica removal, thereby leveraging his expertise and laboratory equipment. NCTU's close proximity to Hsinchu's renowned technology park will allow unique and consistent access to waste water from a variety of IC manufacturers.Silica speciation is variable and exists as a monomeric (H4SiO4), polymerized (5nm), and colloidal (5nm) constituent in water. Silica presents no known health effects, but leads to process hindering scale when present in reverse osmosis (RO), cooling tower, and boiler operations. The integrated circuit (IC) industry produces copious amounts of waste water containing colloidal silica. In order for this water to be reused, it must be purified by RO, which is inherently hindered by silica scale. Taiwan has a high density of IC manufacture and presents itself as a strategic location to study effective silica removal from industrial waste water. This work will evaluate adsorption, co-precipitation, and coagulation mechanisms in their effectiveness for silica removal from IC waste water. Research will proceed under the expertise of Dr. Chihpin Huang, distinguished water purification researcher and Vice President of National Chiao Tung University (NCTU) located in Hsinchu, Taiwan. Dr. Huang's previous studies implementing coagulation and filtration for colloidal silica removal will serve as the foundation for this work. NCTU?s close proximity to an abundance of IC manufactures in Hsinchu will provide advantageous access to a variety of silica waste streams for evaluation.This award under the East Asia and Pacific Summer Institutes program supports summer research by a U.S. graduate student and is jointly funded by NSF and the Ministry of Science and Technology of Taiwan.