ATE Regional Center for Semiconductor & Nanotechnology Education
ATE Regional Center for Semiconductor & Nanotechnology Education
批准号:
1700606
负责人:
Robert Geer
金额:
$225.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-09-01 至 2024-08-31
中文摘要
美国东北部的半导体衍生产品制造业正在扩张,这种扩张增加了对高素质技术劳动力的需求。东北先进技术教育中心(NEATEC)建议支持半导体和半导体衍生行业(即那些基于或合并大量硅晶圆加工、化合物半导体晶圆加工或硅多晶薄膜加工的行业)以及纽约州和新英格兰西部更广泛的纳米技术制造业的技术人员的教育和培训。NEATEC将扩大机会,支持学术项目以及有针对性的外联活动,以招募和吸引服务不足和代表性不足的人群。所有课程都将利用在线兼容的学习管理系统(例如Blackboard),将在线交付与NEATEC培训和实验室设施的动手实验室和/或体验式学习组成部分相结合。这包括在纽约州立大学理工学院新提议的ATE用户设施,这将有助于促进和维持NEATEC的教育/培训内容,并在两年制和四年制学院将这些内容“制度化”。该中心将1)为广泛的半导体衍生行业(如光伏制造(PVM), LED照明制造(LEDLM),电力电子制造(PEM)和集成光子学制造(IPM))开发多个技术教育学术证书课程;2)扩大行业合作者对技能标准分析和体验式学习的承诺;3)扩大社区大学和技术高中的合作伙伴,包括为有风险的学生建立新的NEATEC/技术高中合作伙伴关系,使课程适应纽约中部的技术高中课程,并扩大到麻州和康涅狄格州的技术高中;4)为服务不足和代表性不足的群体开发新的技术教育项目——特别是纽约州中部新分离的退伍军人和国际难民社区(美国永久居民)。NEATEC的核心学术发展团队包括哈德逊山谷社区学院、伊利社区学院、杰斐逊社区学院、莫霍克山谷社区学院、奥农达加社区学院、纽约州的富尔顿蒙哥马利社区学院和康涅狄格州的费尔菲尔德大学。行业合作者包括GlobalFoundries、东京电子、通用电气、SolarCity、Soraa、AIM Photonics、联合技术研究中心和州际可再生能源委员会(IREC)。
英文摘要
Semiconductor-derivative manufacturing in the northeast U.S is expanding, and this expansion is increasing the demand for a highly qualified technical workforce. The Northeast Advanced Technological Education Center (NEATEC) proposes to support the education and training of technicians for the semiconductor and semiconductor-derivative industries (i.e., those industries based on, or incorporating, substantial Si wafer processing, compound semiconductor wafer processing or Si polycrystalline film processing) as well as the broader nanotech-based manufacturing industries in New York State and Western New England. NEATEC will expand opportunities in support of academic programs as well as targeted outreach to recruit and engage underserved and underrepresented populations. All programs will leverage online compatible learning management systems (e.g., Blackboard) to combine online delivery with hands-on laboratory and/or experiential learning components at NEATEC training and lab facilities. This includes a newly proposed ATE user facility at SUNY Polytechnic Institute which will help promote and sustain NEATEC's education/training content and the 'institutionalization' of that content at 2-year and 4-year colleges.This Center will 1) develop multiple academic certificate programs for technological education for a wide range of semiconductor-derivative industries (e.g., Photovoltaic Manufacturing (PVM), LED Lighting Manufacturing (LEDLM), Power Electronics Manufacturing (PEM), and Integrated Photonics Manufacturing (IPM)); 2) expand commitments from industrial collaborators for skill-standard analyses and experiential learning; 3) expand community college and technical high-school partners, including a new NEATEC/Technical High School partnership for at-risk students to adapt curricula to technical high school programs in Central New York with expansion to technical high schools in MA and CT; and 4) develop new technological education programs for underserved and underrepresented groups- specifically newly separated veterans and international refugee communities (permanent U.S. residents) in central New York State. NEATEC's core academic development team includes Hudson Valley Community College, Erie Community College, Jefferson Community College, Mohawk Valley Community College, Onondaga Community College, and Fulton Montgomery Community College in New York State, and Fairfield University in Connecticut. Industry collaborators include GlobalFoundries, Tokyo Electron, General Electric, SolarCity, Soraa, AIM Photonics, United Technologies Research Center, and the Interstate Renewable Energy Council (IREC).
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Development and Implementation of a Semiconductor Workforce Certificate Program Based on a Unified Advanced Manufacturing Competency Model
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批准号:1939219
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项目类别:Standard Grant
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资助金额:$600.0万
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财政年份:2019
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负责人:Robert Geer
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依托单位:
ATE Regional Center for Semiconductor and Nanotechnology Education
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批准号:1555699
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项目类别:Continuing Grant
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资助金额:$194.09万
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财政年份:2015
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负责人:Robert Geer
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依托单位:
Development of a General Use Nanomechanical Imaging System Based on Ultrasonic and Heterodyne Force Microscopy
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批准号:0320569
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项目类别:Standard Grant
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资助金额:$38.5万
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财政年份:2003
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负责人:Robert Geer
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依托单位:
NER: Nanoscale Profiling of the Elastic and Viscoelastic Response of Individual Nanotubes
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批准号:0303764
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项目类别:Standard Grant
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资助金额:$9.35万
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财政年份:2003
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负责人:Robert Geer
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依托单位:
海外基金