ATE Regional Center for Semiconductor & Nanotechnology Education
ATE 半导体区域中心
基本信息
- 批准号:1700606
- 负责人:
- 金额:$ 225万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2017
- 资助国家:美国
- 起止时间:2017-09-01 至 2024-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Semiconductor-derivative manufacturing in the northeast U.S is expanding, and this expansion is increasing the demand for a highly qualified technical workforce. The Northeast Advanced Technological Education Center (NEATEC) proposes to support the education and training of technicians for the semiconductor and semiconductor-derivative industries (i.e., those industries based on, or incorporating, substantial Si wafer processing, compound semiconductor wafer processing or Si polycrystalline film processing) as well as the broader nanotech-based manufacturing industries in New York State and Western New England. NEATEC will expand opportunities in support of academic programs as well as targeted outreach to recruit and engage underserved and underrepresented populations. All programs will leverage online compatible learning management systems (e.g., Blackboard) to combine online delivery with hands-on laboratory and/or experiential learning components at NEATEC training and lab facilities. This includes a newly proposed ATE user facility at SUNY Polytechnic Institute which will help promote and sustain NEATEC's education/training content and the 'institutionalization' of that content at 2-year and 4-year colleges.This Center will 1) develop multiple academic certificate programs for technological education for a wide range of semiconductor-derivative industries (e.g., Photovoltaic Manufacturing (PVM), LED Lighting Manufacturing (LEDLM), Power Electronics Manufacturing (PEM), and Integrated Photonics Manufacturing (IPM)); 2) expand commitments from industrial collaborators for skill-standard analyses and experiential learning; 3) expand community college and technical high-school partners, including a new NEATEC/Technical High School partnership for at-risk students to adapt curricula to technical high school programs in Central New York with expansion to technical high schools in MA and CT; and 4) develop new technological education programs for underserved and underrepresented groups- specifically newly separated veterans and international refugee communities (permanent U.S. residents) in central New York State. NEATEC's core academic development team includes Hudson Valley Community College, Erie Community College, Jefferson Community College, Mohawk Valley Community College, Onondaga Community College, and Fulton Montgomery Community College in New York State, and Fairfield University in Connecticut. Industry collaborators include GlobalFoundries, Tokyo Electron, General Electric, SolarCity, Soraa, AIM Photonics, United Technologies Research Center, and the Interstate Renewable Energy Council (IREC).
美国东北部的半导体衍生品制造业正在扩张,这种扩张增加了对高素质技术劳动力的需求。东北先进技术教育中心(NEATEC)建议支持半导体和半导体衍生产业(即基于或结合大量硅片加工、化合物半导体晶片加工或硅多晶薄膜加工的产业)以及纽约州和新英格兰西部更广泛的以纳米技术为基础的制造业的技术人员教育和培训。NEATEC将扩大支持学术项目的机会,并有针对性地进行外联,以招募和接触服务不足和代表性不足的人群。所有计划都将利用在线兼容的学习管理系统(如Blackboard),将在线授课与NEATEC培训和实验室设施的动手实验室和/或体验式学习部分相结合。这包括在纽约州立大学理工学院新提议的一个用户设施,它将帮助促进和维持NEATEC的教育/培训内容,并将这些内容在2年制和4年制大学“制度化”。该中心将1)为范围广泛的半导体衍生行业(例如,光伏制造(PVM)、LED照明制造(LEDLM)、电力电子制造(PEM)和集成光电子制造(IPM))开发多个技术教育的学术证书课程;2)扩大行业合作者对技能标准分析和经验学习的承诺;3)扩大社区大学和技工高中的合作伙伴,包括针对高危学生的新的NEATEC/技工高中合作伙伴关系,以使课程适应纽约州中部的技工高中项目,并扩大到MA和CT的技工高中;以及4)为服务不足和代表性不足的群体--特别是纽约州中部的新分居退伍军人和国际难民社区(美国永久居民)--制定新的技术教育计划。NEATEC的核心学术发展团队包括纽约州的哈德逊谷社区学院、伊利社区学院、杰斐逊社区学院、莫霍克谷社区学院、奥农达加社区学院和富尔顿·蒙哥马利社区学院,以及康涅狄格州的费尔菲尔德大学。行业合作者包括GlobalFoundries、东京电子、通用电气、SolarCity、SORAA、AIM Photonics、联合技术研究中心和州际可再生能源委员会(IREC)。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Robert Geer其他文献
Robert Geer的其他文献
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{{ truncateString('Robert Geer', 18)}}的其他基金
Development and Implementation of a Semiconductor Workforce Certificate Program Based on a Unified Advanced Manufacturing Competency Model
基于统一先进制造能力模型的半导体劳动力证书计划的开发和实施
- 批准号:
1939219 - 财政年份:2019
- 资助金额:
$ 225万 - 项目类别:
Standard Grant
ATE Regional Center for Semiconductor and Nanotechnology Education
ATE 半导体和纳米技术教育区域中心
- 批准号:
1555699 - 财政年份:2015
- 资助金额:
$ 225万 - 项目类别:
Continuing Grant
Development of a General Use Nanomechanical Imaging System Based on Ultrasonic and Heterodyne Force Microscopy
基于超声波和外差力显微镜的通用纳米机械成像系统的开发
- 批准号:
0320569 - 财政年份:2003
- 资助金额:
$ 225万 - 项目类别:
Standard Grant
NER: Nanoscale Profiling of the Elastic and Viscoelastic Response of Individual Nanotubes
NER:单个纳米管的弹性和粘弹性响应的纳米级分析
- 批准号:
0303764 - 财政年份:2003
- 资助金额:
$ 225万 - 项目类别:
Standard Grant
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