MRI: Acquisition of 30kV Electron Beam Lithography System for Multidisciplinary Research on Nano-Photonics, Nano-Biophysics, Nano-Chemistry, and Nano-Electronics

MRI:购置30kV电子束光刻系统,用于纳米光子学、纳米生物物理学、纳米化学和纳米电子学的多学科研究

基本信息

  • 批准号:
    1828416
  • 负责人:
  • 金额:
    $ 68.95万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2018
  • 资助国家:
    美国
  • 起止时间:
    2018-10-01 至 2021-09-30
  • 项目状态:
    已结题

项目摘要

The ability to pattern designed nanoscale structures precisely is critical for research in nanoscience. Electron Beam Lithography, which uses a scanning electron beam, is one of the most reliable and powerful methods to create patterns with sub-10 nm resolution in a relatively large surface area. This project enables Baylor University to acquire an Ultrahigh Resolution Electron Beam Lithography System for the development of a high-impact, multidisciplinary program of nanoscience research and education at Baylor University. Instrument users will include faculty and students from Baylor University's Physics, Electrical and Computer Engineering, Mechanical Engineering, Chemistry and Biochemistry, and Environmental Science departments. The instrument will expand nanofabrication capabilities at Baylor University for studying physics, optics, chemistry, biology sensing, and optical device applications on the nanometer scale. The instrument's capabilities will open the path for researchers to explore promising nanoscale sciences and applications. The electron beam lithography system will also be incorporated into education and outreach activities, including the Baylor Mayborn Museum events, online outreach activities, Baylor Summer Science Research Program, Advanced Instrumentation Workshop, and Optical Society of America events and workshops. The research and training opportunities provided by this nanofabrication instrument will align with Baylor University's strategic plan to advance research and education and strengthen the engagement with the community.This project will acquire an Ultrahigh Resolution Electron Beam Lithography System to support nanoscience and nanotechnology research and education. The tool provides ultrahigh resolution patterning (8 nm) in combination with the highest level of automation for complex applications. The thermal field emission filament technology, cross-over-free beam path, and column technology produce an extremely high beam current density, extremely low aberrations, fast writing speed, large field sizes, and millimeter-long periodic patterns with zero stitching errors. No other laboratory in the Central Texas region has this type of instrument critical to state-of-the-art nanoscience research. The instrument is ideally suited for research in nano-optics/photonics, nano-biophysics, nano-chemistry, and large-area nanoscale electronic and photonic devices. Examples of the nanoscale applications that can be fabricated include tunable ultrathin optical metasurface components, nanoscale and portable surface-enhanced coherent Raman sensors, point-of-care on-chip optical biosensors, plasmon-assisted photocatalytic reactors, efficient nanoscale bio-medical applications, and next-generation nano-electronic/photonic devices. The acquisition of this electron beam lithography system will not only enable innovative system-oriented nanoscience and nanodevice research activities at Baylor University and nearby colleges, but also facilitate the training of a new generation of students and postdoctoral researchers on nanoscience and nanoengineering at Baylor University.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
精确地图案化设计的纳米结构的能力对于纳米科学的研究至关重要。使用扫描电子束的电子束光刻是在相对大的表面积中创建具有亚10 nm分辨率的图案的最可靠和最强大的方法之一。该项目使贝勒大学能够获得超高分辨率电子束光刻系统,用于贝勒大学纳米科学研究和教育的高影响力,多学科计划的发展。仪器用户将包括贝勒大学物理、电气和计算机工程、机械工程、化学和生物化学以及环境科学系的教师和学生。该仪器将扩大贝勒大学的纳米制造能力,用于研究纳米尺度上的物理、光学、化学、生物传感和光学器件应用。该仪器的能力将为研究人员探索有前途的纳米科学和应用开辟道路。电子束光刻系统还将被纳入教育和推广活动,包括贝勒梅伯恩博物馆活动,在线推广活动,贝勒夏季科学研究计划,先进仪器研讨会和美国光学学会活动和研讨会。这台纳米织物仪器提供的研究和培训机会将与贝勒大学的战略计划保持一致,以推进研究和教育,并加强与社区的接触。该项目将获得超高分辨率电子束光刻系统,以支持纳米科学和纳米技术的研究和教育。该工具可提供高分辨率图案化(8 nm),并结合最高水平的自动化功能,适用于复杂应用。热场发射灯丝技术、无交叉射束路径和列技术产生极高的射束电流密度、极低的像差、快的写入速度、大的场尺寸和毫米长的周期性图案,并且具有零拼接误差。德克萨斯州中部地区没有其他实验室拥有这种对最先进的纳米科学研究至关重要的仪器。该仪器非常适合纳米光学/光子学、纳米生物物理学、纳米化学以及大面积纳米级电子和光子器件的研究。可以制造的纳米级应用的示例包括可调谐拉曼光学超颖表面组件、纳米级和便携式表面增强相干拉曼传感器、现场护理芯片上光学生物传感器、等离子体辅助光催化反应器、高效纳米级生物医学应用和下一代纳米电子/光子器件。收购这种电子束光刻系统不仅将使贝勒大学和附近学院的创新系统导向的纳米科学和纳米器件研究活动,该奖项反映了NSF的法定使命,并通过使用基金会的知识价值和更广泛的影响审查标准。

项目成果

期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Work function investigations of Al-doped ZnO for band-alignment in electronic and optoelectronic applications
  • DOI:
    10.1016/j.apsusc.2019.04.079
  • 发表时间:
    2019-08-01
  • 期刊:
  • 影响因子:
    6.7
  • 作者:
    Drewelow, Grant;Reed, Austin;Lee, Sunghwan
  • 通讯作者:
    Lee, Sunghwan
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Ho Wai Howard Lee其他文献

Ho Wai Howard Lee的其他文献

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{{ truncateString('Ho Wai Howard Lee', 18)}}的其他基金

PFI-TT: Metasurface-Optical Fiber Endoscopy Probe for Advanced Imaging
PFI-TT:用于高级成像的超表面光纤内窥镜探头
  • 批准号:
    2345825
  • 财政年份:
    2024
  • 资助金额:
    $ 68.95万
  • 项目类别:
    Standard Grant
CAREER: Epsilon-Near-Zero Conducting Oxide Metasurface Perfect Absorbers, Color Filters, and Beam Steering Devices with Gate-tunability
职业:Epsilon 近零导电氧化物超表面完美吸收器、滤色片和具有栅极可调性的光束转向器件
  • 批准号:
    2113010
  • 财政年份:
    2020
  • 资助金额:
    $ 68.95万
  • 项目类别:
    Standard Grant
CAREER: Epsilon-Near-Zero Conducting Oxide Metasurface Perfect Absorbers, Color Filters, and Beam Steering Devices with Gate-tunability
职业:Epsilon 近零导电氧化物超表面完美吸收器、滤色片和具有栅极可调性的光束转向器件
  • 批准号:
    1752295
  • 财政年份:
    2018
  • 资助金额:
    $ 68.95万
  • 项目类别:
    Standard Grant

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