Structure and Electronic Gap State Density at Organic Semiconductor Interfaces
Structure and Electronic Gap State Density at Organic Semiconductor Interfaces
批准号:
283296803
负责人:
Dr. Alexander Hinderhofer
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2015
资助国家:
德国
项目状态:
已结题
起止时间:
2014-12-31 至 2021-12-31
中文摘要
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英文摘要
Although several theories have been proposed to determine the electronic level alignment at the interface of two organic semiconductors (OSC), for example the polaron state model or the induced density of states model, so far no satisfying and complete theory for predicting the level offsets has been developed. We will conduct a comprehensive study of the electronic level alignment of organic-organic (small molecule) heterostructures using complementary techniques to understand the relationship between structural defects and electronic structure. The innovative combination of high-resolution X-ray scattering and high sensitivity UPS allows the detailed description of structural defects and electronic states located in the gap region, which are believed to play an essential role in the level alignment. In particular, we will prepare a series of organic-organic heterostructures with suitable material combinations with different electronic (ionization energy, energy gap) and structural (molecular conformation, crystal structure) properties. By variation of the growth parameters (substrate, growth rate, temperature) we will tune the structural properties of the heterostructure, which will in return modify the electronic properties. As the final result we aim for the direct relationship between coherently scattering material volume, that is the essentially defect free volume, versus the HOMO-level offset between the two OSCs.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
DOI:
10.1021/acs.jpcc.1c03096
发表时间:
2021-08
期刊:
The Journal of Physical Chemistry C
影响因子:
--
作者:
[Jan Hagenlocher;Niels Scheffczyk;K. Broch;G. Duva;Nadine Rußegger;Lisa Egenberger;R. Banerjee;S. Kera;F. Schreiber;A. Hinderhofer]
通讯作者:
Jan Hagenlocher;Niels Scheffczyk;K. Broch;G. Duva;Nadine Rußegger;Lisa Egenberger;R. Banerjee;S. Kera;F. Schreiber;A. Hinderhofer
DOI:
10.1021/acs.jpcc.0c00230
发表时间:
2020-05
期刊:
Journal of Physical Chemistry C
影响因子:
3.7
作者:
[V. Belova;A. Hinderhofer;Clemens Zeiser;Timo Storzer;Jakub Rozbořil;Jan Hagenlocher;J. Novák;A. Gerlach;R. Scholz;F. Schreiber]
通讯作者:
V. Belova;A. Hinderhofer;Clemens Zeiser;Timo Storzer;Jakub Rozbořil;Jan Hagenlocher;J. Novák;A. Gerlach;R. Scholz;F. Schreiber
海外基金