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Segment-based molecular surface remeshing by pattern analysis

Segment-based molecular surface remeshing by pattern analysis
通过模式分析进行基于分段的分子表面网格重整
批准号:
19K24346
负责人:
Khan Dawar
金额:
$1.83万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Research Activity Start-up
财政年份:
2019
资助国家:
日本
项目状态:
已结题
起止时间:
2019-08-30 至 2021-03-31

项目摘要

项目成果

相似基金

相关文献

中文摘要
翻译
我们从系统的文献回顾开始,寻找最先进的曲面重新网格化算法。这篇论文已经被IEEE TVCG接受,这是一本非常好的计算机图形学杂志。在此基础上,提出了一种新的分子表面网格化价态优化和角度改进算法。该算法首先对CVT进行初始化,然后进行基于边缘的角度改进和价态优化操作。该方法首先对输入网格进行分段,然后以分而治之的方式重新划分网格。我们已经在许多模型上测试了我们的算法,并发现它具有更好的性能。提出的算法的一部分在MICAD国际会议上提出。同样,剩余的作品将被接受在计算机图形学国际上展示。这篇论文还被推荐发表在《视觉计算机》杂志上。简而言之,我们的成果已经在两次国际会议和两篇期刊文章上发表。
英文摘要
We have started with a systematic literature review to find state-of-the-art algorithms for surface remeshing. The paper has been accepted with IEEE TVCG, which a very good journal in computer graphics. Then we have proposed a novel algorithm for valence optimization and angle improvement of molecular surface remeshing. The proposed algorithm starts with CVT initialization followed by edge-based operations for angle improvement and valence optimization. The proposed method segments the input meshes in segments and then remeshes the segments in a divide-and-conquer manner. We have tested our algorithm on a number of models and have found it with better performance. A part of the proposed algorithm was presented in MICAD an International Conference. Similarly, the remaining work is accepted for presentation in Computer Graphics International. The paper has also been recommended for the journal publication in “The Visual Computer” Journal. In short, our results have been published in two International conferences and two Journal Articles.
期刊论文(6)
专著(0)
科研奖励(0)
会议论文
DOI: 10.1007/s00371-020-01967-6
发表时间: 2020-09
期刊: The Visual Computer
影响因子: --
作者: [Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Zhanglin Cheng;H. Kato]
通讯作者: Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Zhanglin Cheng;H. Kato
DOI: 10.1109/tvcg.2020.3016645
发表时间: 2020-08
期刊: IEEE Transactions on Visualization and Computer Graphics
影响因子: 5.2
作者: [Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Gul Jabeen;Y. Zhang;Xiaopeng Zhang;H. Kat]
通讯作者: Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Gul Jabeen;Y. Zhang;Xiaopeng Zhang;H. Kat
Valence Optimization for Molecular Surface Remeshing
分子表面重网格化的化合价优化
DOI: --
发表时间: 2020
期刊:
影响因子: --
作者: [木戸康平, 佐瀬晃平, 横川拓海, 藤田聡, Dawar Khan]
通讯作者: Dawar Khan
海外基金