Segment-based molecular surface remeshing by pattern analysis
Segment-based molecular surface remeshing by pattern analysis
批准号:
19K24346
负责人:
Khan Dawar
金额:
$1.83万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Research Activity Start-up
财政年份:
2019
资助国家:
日本
项目状态:
已结题
起止时间:
2019-08-30 至 2021-03-31
中文摘要
我们已经开始了系统的文献综述,以找到国家的最先进的算法,表面重新网格化。论文已被计算机图形学的优秀期刊IEEE TVCG接受。在此基础上,提出了一种新的分子表面网格化的价态优化和角度改进算法。该算法首先对CVT进行初始化,然后进行基于边缘的角度改进和效价优化操作。该方法首先对输入网格进行分段,然后采用分而治之的方法对分段网格进行重新划分。我们已经在一些模型上测试了我们的算法,发现它具有更好的性能。该算法的一部分已在MICAD国际会议上发表. 同样,剩余的工作被接受为计算机图形国际。这篇论文也被推荐在《The Visual Computer》杂志上发表。 简而言之,我们的研究结果已发表在两个国际会议和两个期刊文章。
英文摘要
We have started with a systematic literature review to find state-of-the-art algorithms for surface remeshing. The paper has been accepted with IEEE TVCG, which a very good journal in computer graphics. Then we have proposed a novel algorithm for valence optimization and angle improvement of molecular surface remeshing. The proposed algorithm starts with CVT initialization followed by edge-based operations for angle improvement and valence optimization. The proposed method segments the input meshes in segments and then remeshes the segments in a divide-and-conquer manner. We have tested our algorithm on a number of models and have found it with better performance. A part of the proposed algorithm was presented in MICAD an International Conference. Similarly, the remaining work is accepted for presentation in Computer Graphics International. The paper has also been recommended for the journal publication in “The Visual Computer” Journal. In short, our results have been published in two International conferences and two Journal Articles.
期刊论文(6)
专著(0)
科研奖励(0)
会议论文
DOI:
10.1007/s00371-020-01967-6
发表时间:
2020-09
期刊:
The Visual Computer
影响因子:
--
作者:
[Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Zhanglin Cheng;H. Kato]
通讯作者:
Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Zhanglin Cheng;H. Kato
DOI:
10.1109/tvcg.2020.3016645
发表时间:
2020-08
期刊:
IEEE Transactions on Visualization and Computer Graphics
影响因子:
5.2
作者:
[Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Gul Jabeen;Y. Zhang;Xiaopeng Zhang;H. Kat]
通讯作者:
Dawar Khan;Alexander Plopski;Yuichiro Fujimoto;M. Kanbara;Gul Jabeen;Y. Zhang;Xiaopeng Zhang;H. Kat
Valence Optimization for Molecular Surface Remeshing
分子表面重网格化的化合价优化
DOI:
--
发表时间:
2020
期刊:
影响因子:
--
作者:
[木戸康平, 佐瀬晃平, 横川拓海, 藤田聡, Dawar Khan]
通讯作者:
Dawar Khan
海外基金