Elucidation of plasma-assisted atomic layer etching (ALE) mechanism for magnetic materials using organic gas

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The mechanisms of thermal atomic layer etching (ALE) for metals have been elucidated in this study. The chemical interaction of Beta-diketon, i.e., hexafluoroacetylacetone (hfacH), trifluoroacetylacetone (tfacH), and acetylacetone (acacH), with nickel (Ni) and nickel oxide (NiO) have been investigated. Then, the best etchant, which is hfacH molecules, have been nominated and examined with a magnesium oxide (MgO) surface and we could successfully generalize the investigated mechanism for all metals using density functional theory (DFT) simulation. Because of the pandemic COVID-19, I could not travel to Prof. Kessel lab in Eindhoven University of Technology (TU/e) to run some experiments. However, I will writing and publishing the remaining results during my new fellowship.