Low Temperature Photochemical Sol-Gel Processing of Functional Thin Films and their Applications
Low Temperature Photochemical Sol-Gel Processing of Functional Thin Films and their Applications
批准号:
20J40137
负责人:
孫 麗娜
金额:
$3.08万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for JSPS Fellows
财政年份:
2020
资助国家:
日本
项目状态:
已结题
起止时间:
2020-04-24 至 2023-03-31
中文摘要
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英文摘要
The project aims to develop general methodologies for the precise control of functional inorganic thin films in their low temperature solution processing for the realization of roll-to-roll fabrication of flexible electronics. This year, it was found that solution-processed amorphous metal-organic thin film zinc(II) methoxyethoxide (ZME) acts as an efficient and stable electron injection layer (EIL) in inverted organic light-emitting diodes (iOLEDs). In contrast, crystallized ZnO obtained either by utilizing vacuum ultraviolet (VUV) light irradiation or by high temperature annealing caused a strong electron leakage, reducing device efficiency. DC capacitance analysis revealed that ag-ZME has a highly dielectric behavior, allowing it to selectively inject electrons into the LUMO of the organic layer while preventing non-emissive direct reduction of holes. Calcium(II) methoxyethoxide (CME) was also employed as an EIL for comparison and showed nearly the same performance as ZME in iOLEDs, despite its strongly insulating properties. The 4s orbitals of Ca(II) and Zn(II) in ag-CME and ag-ZME are used to regulate the electron injection, these insights offer a new design strategy that uses amorphous dielectric metal-organic thin films as EILs, which may yield high-performance, flexible, and stable electronic devices, such as iOLEDs and perovskite solar cells.
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OLED素子上へのウェットプロセスによるハイバリア構造の開発
OLED元件湿法高阻隔结构的开发
DOI:
--
发表时间:
2020
期刊:
影响因子:
--
作者:
[孫麗娜, 佐々木 樹, 上村 佳歩, 高橋 辰宏, 硯里 善幸]
通讯作者:
硯里 善幸
DOI:
--
发表时间:
2023
期刊:
影响因子:
--
作者:
[Sun Lina, Uda Kyota, Yoshida Tsukasa, Suzuri Yoshiyuki, 孫 麗娜]
通讯作者:
孫 麗娜
塗布型・高バリア性PHPS薄膜におけるVUV光焼成プロセスの解明
阐明涂层高阻隔 PHPS 薄膜的 VUV 光烘烤工艺
DOI:
--
发表时间:
2020
期刊:
影响因子:
--
作者:
[佐々木 樹, 上村 佳歩, 孫 麗娜, 高橋 辰宏, 硯里 善幸]
通讯作者:
硯里 善幸
DOI:
10.1021/acsanm.1c01862
发表时间:
2021-09
期刊:
ACS Applied Nano Materials
影响因子:
5.9
作者:
[Tatsuki Sasaki;Lina Sun;Yu Kurosawa;Tatsuhiro Takahashi;Yoshiyuki Suzuri]
通讯作者:
Tatsuki Sasaki;Lina Sun;Yu Kurosawa;Tatsuhiro Takahashi;Yoshiyuki Suzuri
DOI:
--
发表时间:
2022
期刊:
影响因子:
--
作者:
[L. Sun, T. Sasaki, T. Takahashi, T. Yoshida, Y. Suzuri]
通讯作者:
Y. Suzuri
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