Development of Complex Rotar Target for Puls X-ray Generator

在本计画中，我们提出了一种新的普尔斯X射线源的概念，并研制出一种新型的旋转靶。这种类型的目标被命名为复合（旋转）目标。三个不同的复杂的目标实际上是。它们是Cu-Ag、Cu-Mo和Cu-Cr复合靶。这些靶的横截面图如图1所示。对于镀金的Cu-Ag和Cu-Cr靶材，靶材表面保持均匀。但对钼离子镀制备的铜钼复合靶材，没有尝试保持靶材表面均匀。离子镀钼的厚度为20 <micro>μ m，而镀金银或铬层为150 <micro>μ m。从三个方面对这些靶产生的普尔斯X射线进行了研究：1）白色X射线谱; 2）特征X射线谱; 3）普尔斯X射线特性。结果表明，AgK<alpha>、MoK<alpha>、CuK<alpha>和CrK<alpha>特征X射线的相对强度为1：1.25：5：3，复合旋转靶产生的普尔斯脉冲X射线是周期为1.01毫秒的矩形普尔斯脉冲。

In this project, a new type of rotar targets was developed under a new concept for a puls X-ray source. This type of target are named a complex (rotar) target. Three different complex targets were actually made. They are Cu-Ag, Cu-Mo and Cu-Cr complex targets. The cross-sectional view of these targets are shown in Fig. 1. For Cu-Ag and Cu-Cr targets, which were made by gilding, the surface of the target is kept even. However it was not tried to keep the surface even for Cu-Mo complex target which were made by ion plating of molibdenum. The thickness of ion plated molibdenum is 20 <micro> m, while the gilded silver or chromium layer is 150 <micro> m. The puls X-ray generated from these targes were examined for three aspects; 1) white X-ray spectra, 2) characteristic X- ray spectra and 3) puls X-ray characteritics. It was found from the examination that the relative intensities for AgK <alpha> , MoK <alpha> , CuK <alpha> and CrK <alpha> characteristic X-ray is 1:1.25:5:3 and puls X-ray from the complex rotar targets are well shaped rectangular puls with 1.01 msec period.