权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

Development of Complex Rotar Target for Puls X-ray Generator

脉冲X射线发生器复合旋转靶的研制

基本信息

批准号：
60880014
负责人：
SAKATA Makoto
金额：
$ 3.2万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research
财政年份：
1985
资助国家：
日本
起止时间：
1985 至 1986
项目状态：
已结题

项目摘要

In this project, a new type of rotar targets was developed under a new concept for a puls X-ray source. This type of target are named a complex (rotar) target. Three different complex targets were actually made. They are Cu-Ag, Cu-Mo and Cu-Cr complex targets. The cross-sectional view of these targets are shown in Fig. 1. For Cu-Ag and Cu-Cr targets, which were made by gilding, the surface of the target is kept even. However it was not tried to keep the surface even for Cu-Mo complex target which were made by ion plating of molibdenum. The thickness of ion plated molibdenum is 20 <micro> m, while the gilded silver or chromium layer is 150 <micro> m. The puls X-ray generated from these targes were examined for three aspects; 1) white X-ray spectra, 2) characteristic X- ray spectra and 3) puls X-ray characteritics. It was found from the examination that the relative intensities for AgK <alpha> , MoK <alpha> , CuK <alpha> and CrK <alpha> characteristic X-ray is 1:1.25:5:3 and puls X-ray from the complex rotar targets are well shaped rectangular puls with 1.01 msec period.

本课题根据脉冲x射线源的新概念，研制了一种新型的旋转靶。这种类型的目标被称为复合（旋转）目标。实际上制造了三种不同的复杂目标。它们是Cu-Ag、Cu-Mo和Cu-Cr配合物靶标。这些目标的横截面图如图1所示。对于镀金制备的Cu-Ag和Cu-Cr靶材，靶材表面保持均匀。然而，对于用钼离子镀法制备的Cu-Mo配合物靶，也没有尝试保持表面。离子镀钼层的厚度为20 <micro - > m，镀银层或镀铬层的厚度为150 <micro - > m。从三个方面对这些靶层产生的脉冲x射线进行了检测；1)白色X射线光谱，2)特征X射线光谱，3)脉冲X射线特性。检测发现，AgK < α >、MoK < α >、CuK < α >和CrK < α >特征x射线的相对强度为1:1.25:5:3，复合旋转靶的脉冲x射线为形状良好的矩形脉冲，周期为1.01 msec。