Development of Complex Rotar Target for Puls X-ray Generator

在本项目中，在脉冲X射线源的新概念下开发了一种新型旋转靶。这种类型的目标称为复杂(旋转)目标。实际上制造了三个不同的复杂目标。它们是铜-银、铜-钼和铜-铬复合靶。这些靶的横断面图如图1所示。对于镀金制成的铜-银和铜-铬靶，靶的表面保持平坦。然而，即使是离子镀钼制得的铜钼复合靶，表面也没有得到很好的保护。离子镀钼层厚度为20微米，镀银或镀铬层厚度为150微米。对这些靶材产生的脉冲X射线进行了三个方面的测试：1)白色X射线谱，2)特征X射线谱，3)脉冲X射线特性。实验发现，AGK&lt；α&gt；，Mok&lt；α&gt；，Cuk&lt；α&gt；和Crk&lt；α&gt；特征X射线的相对强度为1：1.25：5：3，来自复杂旋转靶的脉冲X射线是形状良好的矩形脉冲，周期为1.01毫秒。

In this project, a new type of rotar targets was developed under a new concept for a puls X-ray source. This type of target are named a complex (rotar) target. Three different complex targets were actually made. They are Cu-Ag, Cu-Mo and Cu-Cr complex targets. The cross-sectional view of these targets are shown in Fig. 1. For Cu-Ag and Cu-Cr targets, which were made by gilding, the surface of the target is kept even. However it was not tried to keep the surface even for Cu-Mo complex target which were made by ion plating of molibdenum. The thickness of ion plated molibdenum is 20 <micro> m, while the gilded silver or chromium layer is 150 <micro> m. The puls X-ray generated from these targes were examined for three aspects; 1) white X-ray spectra, 2) characteristic X- ray spectra and 3) puls X-ray characteritics. It was found from the examination that the relative intensities for AgK <alpha> , MoK <alpha> , CuK <alpha> and CrK <alpha> characteristic X-ray is 1:1.25:5:3 and puls X-ray from the complex rotar targets are well shaped rectangular puls with 1.01 msec period.