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Investigation of instabilities and striation structures in single filament dielectric barrier discharges in argon at atmospheric pressure

Investigation of instabilities and striation structures in single filament dielectric barrier discharges in argon at atmospheric pressure
大气压下氩气中单丝介质阻挡放电的不稳定性和条纹结构研究
批准号:
407462159
负责人:
Dr. Markus Becker
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2018
资助国家:
德国
项目状态:
已结题
起止时间:
2017-12-31 至 2021-12-31

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英文摘要
In the planed project the formation mechanisms of striated structures and the physical reasons for spontaneous mode transitions and instabilities in dielectric barrier discharges at atmospheric pressure are analysed by means of numerical modelling. For this, a self-consistent hydrodynamic plasma model for the temporal and spatially two-dimensional description of a single filament dielectric barrier discharge in argon at atmospheric pressure will be developed and applied for the investigation of phenomena observed experimentally in the discharge under consideration. In particular, it will be clarified which physical processes are responsible for the formation of the experimentally observed discharge modes and the occurrence of striations along the discharge channel. In addition, the influence of oxygen admixtures on the discharge characteristics is analysed. The novel drift-diffusion approximation for electrons developed previously and the application of established kinetic methods make it possible to study the effect of nonlocal electron energy transport on the generation of striations in dielectric barrier discharges at atmospheric pressure for the first time. The key objective of the project is to gain a deeper physical understanding of the influence of external discharge parameters, such as voltage amplitude and frequency, as well as the impact of gas impurities on the stability of the discharge by means of parametric studies based on a design of experiment analysis. With this, it becomes possible to optimize the input parameters, to control the different discharge modes and to make them usable for applications.
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