Development of Technology for Control of Thin Film Formation, Crystallinity and Interface by Intense Liquid Metal Ion Beams

强液态金属离子束控制薄膜形成、结晶度和界面技术的发展

• 批准号: 01460076
• 负责人: ISHIKAWA J.
• 金额: $ 4.1万
• 依托单位: Kyoto University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460076/
• 关键词: Intense Ion Beam; Liquid Metal Ion Source; Impregnated Electrode; Multipoint Emission; Pure Metal Ion Beam; Deposited Films; Control of Crystallinity; Interface Diffusion; 結晶性; 界面特性

Research on the following subjects was performed with the Grant-in-Aid for Scientific Research (B) : Intensification of the impregnated-electrode-type liquid-metal ion source, development of thin-metal film formation apparatus with the impregnated-electrode-type liquid metal ion source and evaluation of the films deposited by the above apparatus. Results of the research are described below briefly.1) Intensification of the impregnated-electrode- type liquid-metal ion source : before this project, metal ion current of 1.3 mA had been obtained by using the sintered porous tip with three ion-emission points. In 1989, sintered porous tip with eight ion-emission points was newly developed, and in 1990, structure of the ion source was modified so that the ion source was equipped with two to four tip-and-reservoirs. Optimization of the configuration of the ion extraction electordes was also performed by both computer simulation and experiments. As a result, a high germanium ion current of 4.6 … More mA was obtained. Ions of nickel and yttrium were successfully extracted from the impregnated-electrode-type liquid metal ion source. It was found out that ten different Kinds of metal materials can be used as source materials by the imprengnated-electrode-type liquid-metal ion source.2) Development of metal-thin film formation apparatus, formation and evaluation of metal-thin films : in 1989, the film formation apparatus equipped with an impregnated-electrode-type liquid-metal ion source was developed with an aid of computer simulation. In 1990, fundamental characteristics of the deposition apparatus was investigated. Deposition of gold thin films was performed and crystal-linities of the films were evaluated by x-ray diffraction analysis. As a result, it was found that the obtained gold films showed (111) -preferred orientation.(3) Development of evaluation technique of interface diffusion : In order to evaluate the interdiffusion of metal atoms to substrate quantitatively, a simulation code to generate Rutherford backscattering spectra was developed. Applicability of the developed code to the practical backscattering spectra was confirmed with copper films deposited on silicon substrate. The present results indicated that control of the crystallinity of metal thin films will be achieved through further investigation upon the present subject. Less

利用科学研究补助金（B）进行了以下课题的研究：浸渍电极型液态金属离子源的强化、使用浸渍电极型液态金属离子源的金属薄膜形成装置的开发以及由上述装置沉积的膜的评价。现将研究结果简述如下。 1)浸渍电极式液态金属离子源的强化：在本项目之前，利用具有三个离子发射点的烧结多孔尖端获得了1.3mA的金属离子电流。 1989年，新开发了具有8个离子发射点的烧结多孔尖端，1990年，改进了离子源的结构，使离子源配备了2至4个尖端和储存器。还通过计算机模拟和实验对离子提取电极的配置进行了优化。结果，获得了 4.6 … 更多 mA 的高锗离子电流。从浸渍电极型液态金属离子源中成功提取了镍和钇离子。结果发现，浸渍电极型液态金属离子源可以使用十种不同的金属材料作为源材料。2）金属薄膜形成装置的开发、金属薄膜的形成和评价：1989年，借助计算机模拟开发了配备浸渍电极型液态金属离子源的成膜装置。 1990年，研究了沉积装置的基本特性。进行金薄膜的沉积并通过X射线衍射分析评估薄膜的结晶度。结果发现，所获得的金膜表现出(111)-择优取向。(3)界面扩散评估技术的开发：为了定量评估金属原子向基底的相互扩散，开发了生成卢瑟福背散射光谱的模拟代码。开发的代码对实际反向散射光谱的适用性通过沉积在硅基板上的铜膜得到证实。目前的结果表明，通过对本课题的进一步研究将实现对金属薄膜结晶度的控制。较少的

项目成果

Yuji Aoyama et al.: "Application of the ImpregnatedーElectrodeーType Liquid Metal Ion Source to Metal Thin Film Formation" Proceedings of the 12th Symposium on Ion Sources and IonーAssisted Technology ISIAT'89. ISIAT89. 47-52 (1989)

Yuji Aoyama 等人：“浸渍电极型液态金属离子源在金属薄膜形成中的应用”第十二届离子源和离子辅助技术研讨会论文集 ISIAT89 (1989)。

Junzo Ishikawa et al.: "Intense MetalーIonーBeam Production Using an ImpregnatedーElectrodeーType Liquid Metal Ion Source" Review of Scientific Instruments. 61(1). 517-522 (1990)

Junzo Ishikawa 等人：“使用浸渍电极型液态金属离子源产生强金属离子束”科学仪器评论 61(1) (1990)。

J.Ishikawa: "Study on Microfabrication of Ultra Small Field Emitters with Focused Ion Beam" Proceedings of the 13th Symposium on Ion Sources and IonーAssisted Technology. ISIAT90. 315-318 (1990)

J. Ishikawa：“聚焦离子束超小型场发射器的微加工研究”第 13 届离子源和离子辅助技术研讨会论文集（1990 年）。

Hiroshi Tsuji, Yuji Aoyama and Junzo Ishikawa: ""Extraction of mA Class Metal Ion Beams from Multipoint Emission of Impregnated-Electrode-Type Liquid Metal Ion Source"" Proceedings of the 13th Symposium on Ion Sources and IonーAssisted Technology ISIAT'90,

Hiroshi Tsuji、Yuji Aoyama 和 Junzo Ishikawa：“从浸渍电极型液态金属离子源的多点发射中提取 mA 级金属离子束”第 13 届离子源和离子辅助技术研讨会论文集 ISIAT90，

J.Ishikawa: "Milliampere MetalーIonーBeam Formation Using Multipoint Emission by an ImpregnatedーElectrode Type LiquidーMetal Ion Source" Nuclear Instruments and Methods in Physics Research.

J. Ishikawa：“通过浸渍电极型液体金属离子源进行多点发射形成毫安金属离子束”物理研究中的核仪器和方法。