Mutilayr Structural Analysis for Passive film with X ray Potoelectron Spectroscopy and Photo Electrochemical Response.

Corrosion resistance for high Corrosion resistant metallic materials are obtained by passive film这是形式的metallic materials and extremely thin of少10原子实验室。this research project，photo electrochmical response of the passive film in solution was analyzed as in-situ analysistechnique. This技术reverals semiconductor properties of passive film. In This study，passive films格式on pure chromioum was investigated. Photoelectrochemical spectra for variouswave length of incident light was ana；ysed in detail，then separated as several response from each layr which consists passive film of chromium. This隔离是一个明确的introduced by this project. The following resuls were obtained for passivefilm of pure chromium：The passive film of chromium consists of three layrs, that are, Cr (oh_3)，CrO / OH,and cr_2_3 . The response from these layrs decreases with time and change with appliedpotential.这些变化arederived from change in defect density and structure and chemical states。

Corrosion resistance for high corrosion resistant metallic materials are obtained by passive film which is formed on the metallic materials and are extremely thin of less than 10 atomistic layrs. In this research project, photo electrochmical response of the passive film in solution was analyzed as in-situ analysis technique. This technique reverals semiconductor properties of passive film. In this study, passive films formed on pure chromioum was investigated. Photoelectrochemical spectra for various wave length of incident light was ana ; ysed in detail, then separated as several response from each layr which consists passive film of chromium. This separation was firstly introduced by this project. The following resuls were obtained for passive film of pure chromium : The passive film of chromium consists of three layrs, that are, Cr (OH) _3, CrO ・ OH,and Cr_2O_3. The response from these layrs decreases with time and change with applied potential. These changes arederived from change in defect density and structure and chemical states.