Mutilayr Structural Analysis for Passive film with X ray Potoelectron Spectroscopy and Photo Electrochemical Response.

耐腐蚀性高腐蚀性金属材料是由被动电影产生的，它是在金属材料上形成的，而且是极少数少于10个原子层的东西。在这个研究项目中，对被动电影在解决方案中的照片电化学反应被分析为原位分析技术。此技术相对于被动电影的半导体特性。在本研究中，被动电影是在纯铬上形成的。用于事件光的各种波长度的光电化学特性;在细节中，然后根据每个层的假设被动电影的几个反应分开。这篇文章是由这个项目首次介绍的。以下结果被发现用于纯铬的被动电影：三层含铬成分的被动电影，即Cr （OH） _3、CrO · OH和Cr_2O_3。这些层随着时间和变化的减少而对应用潜力的反应。这些变化来自于缺陷密度、结构和化学状态中的变化。

Corrosion resistance for high corrosion resistant metallic materials are obtained by passive film which is formed on the metallic materials and are extremely thin of less than 10 atomistic layrs. In this research project, photo electrochmical response of the passive film in solution was analyzed as in-situ analysis technique. This technique reverals semiconductor properties of passive film. In this study, passive films formed on pure chromioum was investigated. Photoelectrochemical spectra for various wave length of incident light was ana ; ysed in detail, then separated as several response from each layr which consists passive film of chromium. This separation was firstly introduced by this project. The following resuls were obtained for passive film of pure chromium : The passive film of chromium consists of three layrs, that are, Cr (OH) _3, CrO ・ OH,and Cr_2O_3. The response from these layrs decreases with time and change with applied potential. These changes arederived from change in defect density and structure and chemical states.