Photon-Induced Redox Reactions in Amorphous Materials

非晶材料中光子引发的氧化还原反应

• 批准号: 60470070
• 负责人: KAWAZOE Hiroshi
• 金额: $ 4.8万
• 依托单位: Tokyo Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1985
• 资助国家: 日本
• 起止时间: 1985 至 1986
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-60470070/
• 关键词: Optical waveguides; ESR; Photo-Luminescence; 正孔捕獲中心; フォトルミネフセンス; ESR

Thermal decomposition reaction of <TO_2> (T=Sior Ge) melts at high temperature and photon-induced redox reactions related to Ge or P in <SiO_2> glasses were studied by use of ESR, Raman scattering, optical absorption and photo-luminescence. A model reaction was proposed which can totally explain formation of the defects detected in <SiO_2> or <SiO_2> : <GeO_2> glasses. They are E', NBOHC, T-T homobonds, peroxy linkages (or O-O homobonds) and T O or T( <II> ) species. The initial reaction is radical decompositionof T-O bonds at high temperatures and the defects are product of secondary reactions between the initial radical species. The net reaction is expressed as <2TO_2> 2TO+ <O_2> , Which predicts the dependence of concentration of the radical species on <pO_2> during glass preparation.Germanium traps an electron upon low temperature-irradiation of the glasses with -ray and the positive hole is trapped on an oxygen. This is similar to the results for the phosphorus-doped glasses.

采用ESR、拉曼散射、光吸收和光发光等方法研究了<TO_2> (T=Sior Ge)熔体在高温下的热分解反应以及<SiO_2>玻璃中与Ge或P相关的光子诱导氧化还原反应。提出了一个模型反应，可以完全解释<SiO_2>或<SiO_2>: <GeO_2>玻璃中检测到的缺陷的形成。它们是E′、NBOHC、T-T同键、过氧键（或O-O同键）和T- O或T（<II>）种。初始反应是T-O键在高温下自由基分解，缺陷是初始自由基之间二次反应的产物。净反应表示为<2TO_2> 2TO+ <O_2>，这预示了在玻璃制备过程中自由基种类的浓度对<pO_2>的依赖性。锗在低温下用-射线照射玻璃时捕获一个电子，而正极空穴被捕获在一个氧上。这与掺磷玻璃的结果相似。

项目成果

M.Kohketsu;H.Kawazoe: Materials Research Society Symposia Proceedings. (1987)

M.Kohketsu；H.Kawazoe：材料研究学会研讨会论文集。

H.Kawazoe, M. Kohketsu, Y.Watanabe, K.Shibuya and K. Muta: "New Phosphorus Oxygen Hole Center in -Irradiated <SiO_2> : <P_2O_5> Optical Fiber" Materials Research Society Symposia Proceedings. 61. 339-347 (1986)

H.Kawazoe、M. Kohketsu、Y.Watanabe、K.Shibuya 和 K. Muta：“辐照 <SiO_2> 中的新磷氧空穴中心：<P_2O_5> 光纤”材料研究学会研讨会论文集。

Y.Watanabe;H.Kawazoe;K.Shibuya;K.Muta: Japanese Journal of Applied Physics. 25. 425-431 (1985)

Y.Watanabe；H.Kawazoe；K.Shibuya；K.Muta：日本应用物理学杂志。

H.Kawazoe;Y.Watanabe;K.Shibuya;K.Muta: Materials Research Society Symposia Proceedings. 61. 349-357 (1986)

H.Kawazoe；Y.Watanabe；K.Shibuya；K.Muta：材料研究学会研讨会论文集。

H.Kawazoe;M.Kohketsu;Y.Watanabe;K.Shibuya;K.Muta: Materials Research Society Symposia Proceedings. 61. 339-347 (1986)

H.Kawazoe；M.Kohketsu；Y.Watanabe；K.Shibuya；K.Muta：材料研究学会研讨会论文集。