Study on microstructure and properties of micro-composite-type inorganic films.
Study on microstructure and properties of micro-composite-type inorganic films.
批准号:
62470064
负责人:
KANAMARU Fumikazu
金额:
$3.46万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1987
资助国家:
日本
项目状态:
已结题
起止时间:
1987 至 1989
中文摘要
无机材料如固体电解质、涂层材料、光电子材料和超导体的薄膜是用非平衡反应过程如反应溅射和等离子体CVD方法制备的。研究了它们的性能、显微结构和杂化作用之间的关系.固体电解质:(i)通过在石英玻璃基底上直接碘化薄Ag膜制备的β-AgI膜具有比本体β-AgI大2个数量级的高离子电导率。(ii)用等离子体化学气相沉积法制备了c面平行于薄膜的TiS_2薄膜,并在锂电池上观察到了出乎意料的大放电容量.金属氮化物薄膜:(i)采用射频溅射法制备了TiN-AlN系新型混晶薄膜。带隙。在0 - 5.2eV的范围内变化,对应于组成,并且膜的抗氧化耐久性得到显著改善。(ii)采用反应溅射法制备了MoN-T_MN(T_MN= Ti,Zr,Nb)系混晶薄膜。NaCl型和WC型结构的稳定区域在系统中被确定为价电子数和金属与氮的原子半径比的函数。根据XPS和空穴效应的测量结果,阐明了它们的电子结构。在富NO组份区新获得的WC型混晶具有超导电性,T_c高达11 - 15 K。超导氧化膜:在900 ℃以上的温度下,氟的加入显著地促进了YBa_2Cu_3O_y薄膜中YBCO晶体的片状生长和c面平行于薄膜的择优取向。
英文摘要
The thin films of inorganic materials such as solid electrolytes,coating materials ,opto-electronic materials and superconductors were prepared using non-equilibrium reaction processes, e.g. reaction sputtering and plasma CVD methods. The relationships among their properties, microstructure and hybridization were investigated as follows.1 . Solid electrolyte: (i) The beta-AgI film prepared by direct iodization of the thin Ag film on the silica glass substrate exhibited high ionic conductivity larger by 2-order than that of bulk beta-AgI. (ii)TiS_2 films with the c-plane parallel to the film was fabricated by plasma CVD, and unexpectedly large discharge capacity was observed on a Li battery.2. Metal nitride films: (i)New mixed crystal films in the TiN-AlN system were prepared by rf-sputtering. Their band gap. varied in a range from 0 to 5.2eV corresponding to the composition, and durability against oxidation for the films was intensively improved. (ii) The mixed crystal films of the MoN-T_MN (T_MN= Ti,Zr,Nb) systems were prepared by a reaction sputtering. Stability regions of NaCl-type and WC-type structures in the systems were determined as functions of the number of valence electron and the atomic radius ratio of metal to nitrogen. Their electronic structure was elucidated on the basis of the results of XPS and hole effect measurements. The newly obtained WC-type mixed crystals in the No-rich composition region exhibited superconductivity with T_c as high as 11 - 15K .3 . Superconducting oxide film: Fluorine addition to YBa_2CU_3O_y film intensively enhanced both platy YBCO crystal growth above 900゚C and preferred orientation with the c-plane parallel to the film.
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S. Kikkawa, R. Shimanouchi-Futagami, M. Koizumi: "Plasma assisted CVD of TiS_2." Appl., Phys., A49, 105(1989).
S. Kikkawa、R. Shimanouchi-Futagami、M. Koizumi:“TiS_2 的等离子体辅助 CVD”。
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通讯作者:
赤澤敏之: 北海道立工業試験場報告. 287. 23-32 (1988)
赤泽敏之:北海道工业研究所报告。287. 23-32 (1988)
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Shinichi Kikkawae Deposition Process and Some Characteristics of TiS_2 Prepared by Plasma CVD: "Mem.Inst.Sci.Ind.Res.,Osaka Univ.(in press)"
Shinichi Kikkawae 沉积工艺和等离子 CVD 制备 TiS_2 的一些特性:“Mem.Inst.Sci.Ind.Res.,Osaka Univ.(in press)”
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S. Inamura, K. Nobugai, F. Kanamaru, S. Emura: "preparation of Wurtzite-type Al_<1-x> Ti_x N(0<less than or equal>x<less than or equal>0.17) thin films" Chem. Express, 2, 539(1987).
S. Inamura、K. Nobugai、F. Kanamaru、S. Emura:“纤锌矿型Al_<1-x> Ti_x N(0<小于等于>x<小于等于>0.17)薄膜的制备”
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N. Moriyama, S. Kikkawa, M. Takahashi, K. Nobugai, F. Kanamaru: "Crystallization of Y-Ba-Cu-O thin film prepared by rf-sputtering." J. Jpn., Soc. Powd. and Powd. Metall., 36, 123(1989).
N. Moriyama、S. Kikkawa、M. Takahashi、K. Nobugai、F. Kanamaru:“通过射频溅射制备 Y-Ba-Cu-O 薄膜的结晶”。
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共 38 条
Preparation and properties of nano structured magnetic meterials disperced composite film
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批准号:06453077
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.54万
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财政年份:1994
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负责人:KANAMARU Fumikazu
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依托单位:
New synthetic processes and characterization of inorganic materials.
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批准号:61303009
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项目类别:Grant-in-Aid for Co-operative Research (A)
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资助金额:$4.03万
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财政年份:1986
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负责人:KANAMARU Fumikazu
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依托单位: