Al concentration dependent oxidation behavior of Ti1-yAlyB2 and Ti1-xAlxN coatings

Ti1-yAlyB2 和 Ti1-xAlxN 涂层的 Al 浓度依赖性氧化行为

• 批准号: 449548449
• 负责人: Professor Jochen M. Schneider, Ph.D.
• 金额: --
• 依托单位: Lehrstuhl für Werkstoffchemie (MCh)
• 依托单位国家: 德国
• 项目类别: Research Grants
• 资助国家: 德国
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/449548449?language=en
• 关键词: Al; concentration; dependent; oxidation; behavior

We have demonstrated the synthesis for single phase V1-xAlxN coatings with unprecedented Al concentrations of up to x = 0.75. This supersaturation was obtained by separating the film-forming species in time and energy domains through synchronization of the pulsed substrate bias with intense periodic fluxes of energetic Al ions during reactive hybrid high power pulsed magnetron sputtering. Here, we will utilize massive Al ion fluxes [*] for the first time during synthesis of Ti1-xAlxN and Ti1-yAlyB2 coatings with maximized Al concentrations (ymax , xmax) following the subplantation approach conceived by G. Greczynski and the applicant. In addition to the two films with maximized Al concentration, also films with a 5 at.% and 10 at.% lower Al concentration than the respective maximum concentration will be grown and evaluated for both material systems. The oxidation behavior of all six compositions will be evaluated at temperatures of up to 1000 °C and exposure times of up to 60 min in a furnace and by differential scanning calorimetry. [*] Massive ion fluxes are enabled by recent developments in power supply design allowing for 1000 A max current compared to the previously employed 500 A maximum current rating.

我们已经证明了单相V1-xAlxN涂层与前所未有的Al浓度高达x = 0.75的合成。这种过饱和是通过在反应混合高功率脉冲磁控溅射过程中，通过脉冲衬底偏压与高能Al离子的强烈周期性通量的同步，在时间和能量域中分离成膜物种而获得的。在这里，我们将在合成Ti 1-xAlxN和Ti 1-yAlyB 2涂层期间首次利用大量Al离子通量[*]，其中Al浓度（ymax，xmax）最大化遵循G. Greczynski和申请人除了具有最大Al浓度的两种膜之外，具有5at.和10at.%之间变化对于两种材料系统，将生长和评估比各自的最大浓度低的Al浓度。所有六种组合物的氧化行为将在高达1000 °C的温度和炉中暴露时间长达60分钟的条件下通过差示扫描量热法进行评估。[*]电源设计的最新发展使大量离子通量成为可能，与以前采用的500 A最大电流额定值相比，最大电流可达1000 A。