Al concentration dependent oxidation behavior of Ti1-yAlyB2 and Ti1-xAlxN coatings

Ti1-yAlyB2 和 Ti1-xAlxN 涂层的 Al 浓度依赖性氧化行为

• 批准号: 449548449
• 负责人: Professor Jochen M. Schneider, Ph.D.
• 金额: --
• 依托单位: Lehrstuhl für Werkstoffchemie (MCh)
• 依托单位国家: 德国
• 项目类别: Research Grants
• 资助国家: 德国
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/449548449?language=en
• 关键词: Al; concentration; dependent; oxidation; behavior

We have demonstrated the synthesis for single phase V1-xAlxN coatings with unprecedented Al concentrations of up to x = 0.75. This supersaturation was obtained by separating the film-forming species in time and energy domains through synchronization of the pulsed substrate bias with intense periodic fluxes of energetic Al ions during reactive hybrid high power pulsed magnetron sputtering. Here, we will utilize massive Al ion fluxes [*] for the first time during synthesis of Ti1-xAlxN and Ti1-yAlyB2 coatings with maximized Al concentrations (ymax , xmax) following the subplantation approach conceived by G. Greczynski and the applicant. In addition to the two films with maximized Al concentration, also films with a 5 at.% and 10 at.% lower Al concentration than the respective maximum concentration will be grown and evaluated for both material systems. The oxidation behavior of all six compositions will be evaluated at temperatures of up to 1000 °C and exposure times of up to 60 min in a furnace and by differential scanning calorimetry. [*] Massive ion fluxes are enabled by recent developments in power supply design allowing for 1000 A max current compared to the previously employed 500 A maximum current rating.

我们已经证明了单相V1-XALXN涂层的合成，其前所未有的Al浓度最高为X = 0.75。通过在反应性杂交高功率脉冲磁控蛋白溅射过程中，脉冲底物偏置与脉冲底物偏置的同步与强烈的能量周期通量，通过在时间和能量结构域中分离膜形成物种，从而获得了这种过饱和。在这里，我们将在由G. greczynski和适用的替代方法构成的分期植入术方法之后，首次使用巨大的抗离子通量[*]，首次使用最大Al浓度（Ymax，Xmax）的Ti1-XALXN和TI1-YALYB2涂层。除了最大Al浓度的两部薄膜外，还将增长比相应最大浓度低的5个Al Al浓度的膜，并对两种材料系统进行评估。所有六个组合物的氧化行为将在高达1000°C的温度下评估，并在炉子和不同的扫描量热法下进行长达60分钟的暴露时间。 [*]与先前执行的500 A最大电流额定值相比，电源设计的最新开发允许1000 A最大电流实现巨大的离子通量。