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Fundamental Clarification of Triboelectromagnetic Phenomena andDevelopment of Triboplasma Application Technology

Fundamental Clarification of Triboelectromagnetic Phenomena andDevelopment of Triboplasma Application Technology
摩擦电磁现象的基本阐明及摩擦等离子体应用技术的发展
批准号:
20246035
负责人:
NAKAYAMA Kleiji
金额:
$29.95万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2012

项目摘要

项目成果

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中文摘要
翻译
分析了摩擦电磁现象产生的基本机理,重点讨论了摩擦等离子体的产生,并对摩擦等离子体应用技术的发展提出了指导意见。结果发现,摩擦等离子体的产生,甚至内部的滑动接触,从内部的油润滑下的滑动接触的光子发射被证明是由溶解的气体分子的激发。成功地测量了摩擦等离子体的温升,证明了摩擦等离子体是一种非平衡低温等离子体。从理论上分析了摩擦等离子体的产生机理,给出了差距中的电势和带电粒子的分布。进一步,提出了油润滑条件下摩擦等离子体产生的新模型,阐明了摩擦等离子体产生的机理是由于滑动接触后间隙中形成的空穴中的电子雪崩过程。提出了通过施加磁场和控制摩擦材料的电阻率来控制摩擦等离子体的观点。
英文摘要
Fundamental mechanism of the triboelectromagnetic phenomena was analyzed focusing on the triboplasma generation and the guideline to the development of the triboplasma application technology was proposed. It was found that the triboplasma is generated even inside the sliding contact, and the photon emission from the inside of sliding contact under oil lubrication was shown to be caused by the excitation of the dissolved gas molecules. The temperature rise of the triboplasma was successfully measured to give that the triboplasma is non-equilibrium low temperature plasma. The mechanism of photon emission from the sliding surface was analyzed to be caused by the attack of the electrons in the plasma, and the triboplasma generationwas theoretically analyzed to give the potential and the charged particle distributions in the gap. Further, the mechanism of triboplasma generation under oil lubrication was clarified to be due to the electron avalanche process in the cavity formed in the rear gap of the sliding contact with a new model. It was proposed that triboplasma can be controlled by magnetic field application and control of the electric resistivity of tribomaterials.
期刊论文(69)
专著(0)
科研奖励(0)
会议论文
Characterization of crystallographic defects in homoepitaxial diamond films by synchrotron X-ray topography and cathodoluminescence ECSCRM 2010
通过同步加速器 X 射线形貌和阴极发光表征同质外延金刚石薄膜中的晶体缺陷 ECSCRM 2010
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [H.Umezawa, Y.Kato, A.M.M.Omer, H.Yamaguchi, S.Shikata]
通讯作者: S.Shikata
TSEE Phenomena from Defects in Insulators Formed by Scratching and Electron Bombardment
划痕和电子轰击形成的绝缘体缺陷的 TSEE 现象
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [A.Gatsenko, Keiji Nakayama]
通讯作者: Keiji Nakayama
DOI: 10.1088/0022-3727/42/7/075307
发表时间: 2009-04-07
期刊: JOURNAL OF PHYSICS D-APPLIED PHYSICS
影响因子: 3.4
作者: [Matta, C., Eryilmaz, O. L., Nakayama, K.]
通讯作者: Nakayama, K.
Tribology of Diamond-Like Carbon Films : chapter 11 - Triboemission and triboplasma generation with DLC films(54, 査読有)
类金刚石碳薄膜的摩擦学:第 11 章 - DLC 薄膜的摩擦发射和摩擦等离子体生成(54,同行评审)
DOI: --
发表时间: 2008
期刊:
影响因子: --
作者: [Van Ho, Shinichi Hirai, 山田純, K.Nakayama]
通讯作者: K.Nakayama
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