Structure and optical properties of porous silica modified by electronic excitation process
Structure and optical properties of porous silica modified by electronic excitation process
批准号:
14350352
负责人:
UCHINO Takashi
金额:
$8.38万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2004
中文摘要
对烧结气相二氧化硅的结构和PL性能进行了较详细的研究。红外和拉曼测量结果表明,完全烧结透明样品的网络结构与块体硅玻璃的网络结构平均相当。然而,烧结后的气相二氧化硅的FESEM图像表明,所得的透明样品仍然具有源自原始气相二氧化硅颗粒的边界和界面区域。时间分辨PL测量表明,烧结透明样品的PL光谱至少由位于-410、-360和-510 nm的三个发射带组成。在不同的时间尺度下,这三个PL波段分别用不同的衰减曲线来表征。我们认为光激发电子的阱控制扩散是导致缓慢拉伸指数PL分量的原因。另一方面,在经历上述色散扩散过程之前,快速纯指数PL分量是由电子-空穴对的辐射复合产生的。-360 nm PL波段在微秒级时间尺度上呈指数衰减。观察到的纯指数衰减表明,与~ 360 nm PL发射有关的电子态是局域化的,可以简单地用双态模型表示。虽然在氧化多孔硅和多孔二氧化硅中也有类似的紫外发光带,但目前的~ 360 nm发光带的衰减时间(~ μs)比以前报道的发光带的衰减时间(~ ns)要长得多,这表明这些发光带的来源不同。
英文摘要
We have studied the structure and PL properties of sintered fumed silica in detail. From the results of infrared and Raman measurements, it has been shown that the network structure of the fully sintered transparent sample is, on average, comparable to that of the bulk silica glass. However, the FESEM image of the sintered fumed silica demonstrates that the resulting transparent sample still has boundary and interface regions derived from the original fumed silica particles. Time-resolved PL measurements have revealed that the PL spectrum of the sintered transparent sample consists at least of three emission bands located at -410, -360, and -510 nm. These three PL bands are characterized respectively by different decay curves in different times scales. We suggest that a trap-controlled diffusion of the photoexcited electrons is responsible for the slow stretched exponential PL component. On the other hand, the fast pure exponential PL component results from radiative recombinations of electron-hole pairs before experiencing the above dispersive diffusion process. The -360-nm PL band shows a pure exponential decay in the time scale of microseconds. The observed pure exponential decay implies that the electronic states related to the 〜360-nm PL emission are localized and can be represented simply by a two state model. Although similar UV PL bands have been reported in oxidized porous silicon and porous silica, the decay time (〜μs) of present 〜360-nm PL is much longer than that of the previously reported ones (〜ns), suggesting that these PL bands have different origins.
期刊论文(82)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
Anelastic Compression of Nanometer-Sized Silica Particles under High Pressure : A High Energy X-ray Diffraction Measurement
高压下纳米二氧化硅颗粒的滞弹性压缩:高能 X 射线衍射测量
DOI:
--
发表时间:
2003
期刊:
Physical Review B 67・9
影响因子:
--
作者:
[T.Uchino]
通讯作者:
T.Uchino
T.Uchino: "Microscopic Mechanism of Radiation Induced Structural Changes in Pure and Doped SiO_2 Glass"Physics and Chemistry of Glasses. 43. 149-154 (2002)
T.Uchino:“纯SiO_2玻璃和掺杂SiO_2玻璃中辐射引起结构变化的微观机制”玻璃物理和化学。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
T.Uchino: "Structure of As_2S_3 Glass in Electronically Excited States"J. Optelectron. Adv. Mat.. 4・3. 605-609 (2002)
T. Uchino:“电子激发态的 As_2S_3 玻璃的结构” J. Adv. 4・3 (2002)
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
T.Uchino: "A Novel Pressure-Induced Polymorphic Transition from Fumed Silica to Transparent Amorphous SiO_2 at Room Temperature"J.Phys.: Condens.Matter. 14・44. 11111-11114 (2002)
T. Uchino:“室温下从气相二氧化硅到透明无定形 SiO_2 的新型压力诱导多晶型转变”J.Phys.:Condens.Matter. 14・44 (2002)。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
DOI:
10.1063/1.1505979
发表时间:
2002-09
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[Masahide Takahashi;K. Ichii;Y. Tokuda;T. Uchino;T. Yoko;J. Nishii;T. Fujiwara]
通讯作者:
Masahide Takahashi;K. Ichii;Y. Tokuda;T. Uchino;T. Yoko;J. Nishii;T. Fujiwara
共 33 条
Synthesis structure and properties of silica-based photoluminescence materials from nanometer-sized silica particles
-
批准号:17206068
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$25.88万
-
财政年份:2005
-
负责人:UCHINO Takashi
-
依托单位:
海外基金