Analysis of Two Dimensional Velocity Space Structure of Ions in Simulated Divertor Plasma With High Angular
Analysis of Two Dimensional Velocity Space Structure of Ions in Simulated Divertor Plasma With High Angular
批准号:
14580520
负责人:
FUJITA Hiroharu
金额:
$1.79万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2003
中文摘要
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英文摘要
One of important problems in divertor plasma is to reduce the heating load from internal plasma to divertor plate where the sputtering of the plate is frequently, occurred in nuclear fusion reactor. When the sputtering of the plate is discussed, it is important to clarify two dimensional behavior of energy and temperature of ions incident to the plate. In this work, measurement of two dimensional velocity distributions of ions has been performed in DC discharge plasma. Ion temperature measurement has been done in simulated divertor plasma using inductively coupled plasma. Energy distribution functions of ions incident to substrate biased negatively has also measured in electron cyclotron resonance microwave plasma. In these measurements, grid and directional analyzers were used. The interesting results on ion behaviors were obtained as follows.1.Measurement of ion two-dimensional velocity space structure by means of directional analyzerFor fundamental experiment on ion velocity distrib … More ution, two dimensional velocity distribution functions were measured in do discharge double plasma using directional analyzer which was consisted from capillary plate, retarding grid and ion collector. The analyzer has a high angular resolution of 1.4 degree. The two dimensional ion velocity space maps were estimated from velocity distribution functions obtained at all directions. It was confirmed that the directional analyzer could evaluate the spread on two dimensional ion velocity spaces.2.Development of stimulated divertor plasmaInductively coupled plasma (ICP) source where 3 turns helical antenna was wounded around glass tube with 3 cm, is used as one of the stimulated divertor plasma. ICP with electron 'density of 10^<12> cm^<-3> was obtained for optimum stimulated divertor plasma.3.Ion measurement in ICPIon measurement Ti was done comparing with electron temperature Fe in ICP under a divergent magnetic configuration. The dependency of the magnetic field and gas pressure on both of T_e and T_i was also studied. In the former case, T_i was found to decrease for ion hole-parameter hi【greater than or equal】3, while Te decreased drastically for electron hole-parameter h_e【greater than or equal】200 and saturated for h_e【greater than or equal】10^3. In the latter case, T_e in, a non-magnetized plasma (B=0) provides the same gas pressure tendency as the T_i at magnetic flux density B=575G, while Te at B=575 G decreased, gradually with the pressure.4.Measurement of energy distribution of ions incident to RF biased substrateTime averaged energy distribution functions of ions impacted in the rf-biased substrate have been investigated in ECR microwave plasma from the viewpoint of the ion plasma frequency. It was observed that TIIEDF has a bimodal profile for a wide range of f_<pi>/f_<b-> Here fpi and fb are ion plasma frequency and RF biased frequency, respectively. It was found that even for f_<pi>/f_b<<1, the bimodal profile was observed at high rf-biased voltages. It was revealed that the energy difference in TIIEDFs increased with increasing the rf-biased voltage for f_<pi>/f_b<1, while for f_<pi>/f_b>1, the energy difference decreased with increasing f f_<pi>/f_<b->. Less
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H.Fujita: "Annular Profile of Dust Density near RF-Powered Electrode in a Capacitively Coupled Plasma"Japanese Journal Applied Physics. 41・4. 2195-2198 (2002)
H.Fujita:“电容耦合等离子体中射频供电电极附近的灰尘密度的环形分布”日本应用物理学杂志 41・4(2002 年)。
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藤田寛治(分担): "マイクロ波プラズマの技術(プラズマ調査専門委員会編)"オーム社. 257 (2003)
Hiroharu Fujita(撰稿人):“微波等离子体技术(等离子体研究专家委员会编辑)”Ohmsha 257(2003)。
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H.Fujita: "Observation of an Inductively Coupled RF Discharge with One-Turn Internal Antenna"Japanese Journal Applied Physics. 41・5. 3114-3119 (2002)
H.Fujita:“用一圈内部天线进行感应耦合射频放电的观察”日本应用物理学杂志 41・5 3114-3119(2002 年)。
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Y.Ohtsu, K.Yoshinaga, H.Fujita: "Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasm"Japanese Journal Applied Physics. Vol.42. 7552-7556 (2004)
Y.Ohtsu、K.Yoshinaga、H.Fujita:“电子回旋共振微波等离子体中撞击 RF 偏置基底的离子的时间平均能量分布函数”日本应用物理学杂志。
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Y.Ohtsu: "Time-averaged energy distribution function of ions impacted on an rf biased substrate in ECR microwave plasma by means of a conventional energy analyzer"Japanese Journal Applied Physics. 43・1. 328-331 (2004)
Y.Ohtsu:“通过传统能量分析仪在 ECR 微波等离子体中撞击射频偏压基底的离子的时间平均能量分布函数”,日本应用物理学杂志 43・1(2004 年)。
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共 17 条
Development of generation method of microwave plasmas with an annular slot antenna for large diameter wafer etching
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批准号:06558065
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$3.33万
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财政年份:1994
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负责人:FUJITA Hiroharu
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依托单位: