Reactive RF/DC sputter deposition tool for transparent electrodes, insulators and contacts

溅射薄膜和异质结构是先进材料研究和开发新型功能（光电）电子器件和传感器的基本要求。这种反应磁控溅射工具用于处理高达6英寸的晶圆衬底，是锡根大学中央纳米制造设施的主要仪器之一。这个核心设施及其洁净室系统地为科学技术学院及其他学院的所有研究人员提供访问权限。北莱茵-威斯特伐利亚州与该大学正在将其整合到一个新的纳米科学中心，该中心拥有现代化的600平方米的ISO 4级洁净室。该战略是在dfg资助的微纳米分析核心设施MNaF的明确共享方法下，合并该大学的传感器系统中心、微纳米化学与工程中心和创新材料多学科中心的材料和器件开发纳米制造基础设施。该战略期望在最佳科学水平上可持续有效地使用该沉积工具和所有其他纳米技术仪器，配备专门的支持人员，对所涉及的过程进行专业优化，以及系统的用户访问组织/培训。该沉积工具与其他制造仪器以及纳米分析实验室的紧密联系，可以有效地开发对环境敏感甚至反应性材料（例如相变或能源材料）的高度专题研究。因此，从材料合成到最终设备应用或表征的整个工艺链将在低温和/或高真空条件下实现，并在各个仪器之间具有足够的传输机制。该溅射工具将主要用于沉积化学计量介质薄膜、透明电极和相变材料。这种功能薄膜是光学和生物传感器、钙钛矿太阳能电池和基于二维材料的纳米电子器件等广泛研究活动的基础。此外，它将用于沉积结构电极，这使得研究具有新型物理和化学性质的材料成为可能。研究课题为自旋轨道电子学、激光诱导等离子体、量子发射体以及离子传导。溅射薄膜也将用于构建定制的mems芯片，用于MNaF的原位实验。溅射工具将配备四个RF/DC溅射源，一个等离子体源，用于衬底清洗以及化学计量薄膜和多层膜的反应沉积。此外，它配备了一个灵活的基板支架和加热。为了便于活性样品的研究，仪器将额外配备专用的真空负载锁。强制接送班车将与本提案包的所有其他设备共享。

Sputtered films and heterostructures are a fundamental requirement for advanced materials research and to develop novel functional (opto-)electronic devices and sensors.This reactive magnetron sputter tool for processing up to 6” wafer substrates is one major instrument of the central nanofabrication facility at the University of Siegen. This core facility with its clean room systematically provides access to all researchers of the School of Science and Technology and beyond. The state of North Rhine-Westphalia together with the university is integrating this into a new nanoscience center with a modern 600m2 ISO 4 clean room. The strategy is to merge the university’s nanofabrication infrastructure for materials and device development at the Center for Sensor Systems, the Center for Micro- and Nanochemistry and Engineering and the Multidisciplinary Center for Innovative Materials under the clear sharing methodology of the DFG-funded Micro- and Nanoanalytics Core Facility MNaF. This strategy anticipates a sustainable and efficient use of this deposition tool and all other nanotechnological instruments, at the best scientific level, with specialized support personnel, a professional optimization of the involved processes, and a systematic user access organization/training. The close vicinity of the deposition tool to other fabrication instrumentation as well as to the nanoanalytical laboratories allows the efficient development of highly topical research on environmentally sensitive or even reactive materials, e.g., phase-change or energy materials. Therefore, the whole process chain from material’s synthesis to its final device application or characterization will be possible under cryogenic and/or high-vacuum conditions with adequate transport mechanisms between individual instruments.This sputtering tool will dominantly be utilized to deposit stoichiometric dielectric thin films, transparent electrodes and phase-change materials. Such functional thin films are the basis for a broad range of research activities on optical and biological sensors, perovskite solar cells and nanoelectronic devices based on 2D materials. Moreover, it will be used to deposit structured electrodes, which enable research on materials with novel physical and chemical properties. Research topics are spin orbitronics, laser-induced plasmas, quantum emitters as well as ion conduction. Sputtered thin films will also utilized to construct tailored MEMS-based chips for in situ experiments at the MNaF.The sputter tool will be equipped with four RF/DC sputter sources, a plasma source for substrate cleaning as well as the reactive deposition of stoichiometric thin films and multilayers. Moreover, it comes with a flexible substrate holder and heating. To facilitate the research on reactive specimens, the instrument will additionally be equipped with a dedicated vacuum load lock. The mandatory transfer shuttle is will be shared with all other equipment of this proposal bundle.