The Macquarie National Low Temperature Optoelectronic Thin Film Growth Facility

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Funding is requested for an Australian facility for the growth of nitride and oxide thin films with in-situ optical analysis equipment for the monitoring of growth parameters. It is envisaged that this facility would be for the development of materials and device structures for photonic, electronic and optoelectronic applications. The facility will also provide a leading Australian source of these materials for fundamental material studies utilising nuclear analysis and implantation technologies, high resolution X-ray diffraction, high spatial resolution micro-cathodoluminescence and other forms of analysis. Ex-situ optical analysis equipment is also requested for post-growth evaluation to compliment and evaluate the in-situ analysis.