Development of material atlas of DLC with pay attention to density

关注密度的DLC材料图谱开发

• 批准号: 17560594
• 负责人: NISHINO Junichi
• 金额: $ 2.3万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2005
• 资助国家: 日本
• 起止时间: 2005 至 2006
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-17560594/
• 关键词: XRR; solid state properties of surface ＆ interface; DLC; density; CVD; XRR; アモルファスカーボン; マテリアルアトラス

We could get X-ray reflectometry (XRR) by devising a slit and mensuration with general X-ray diffraction device with fixed target X-ray tube. It investigated about the density, a film thickness and the precision of the surface coarseness more. When it was compared with (100) Si, the precision of the density was 0.3% of the errors as that result. When it was compared with ellipsometry method, a film thickness was within 10%. The difference was about 10% when surface roughness was confirmed by the atomic force microscope observation method. But, there was a limitation in the test portion, and found that surface roughness was necessary in the 5 nm following. As for the XRR method with general X-ray diffraction device with fixed target X-ray tube, it found that it was a very excellent method in comparison with other density, a film thickness and the surface roughness mensuration.Carbon films were deposited by the electrolytic method, the applide voltage increased with the refractive index and the density of the carbon films decreased. When a electrode spacing (D) is 1.0 mm, the density and the refractive index of the carbon films were higher than the films synthesized from D =0.5 mm. That action wasn't dull though it rose when the density of a film rose as for the refractive index of a carbon film. As for this, we can concidered that the surface of the carbon film becomes rough caused by the rise in applied voltage and the refractive index decreases. Therefore, We had to take the roughness of the films into consideration as a parameter, too, and found that a refractive index didn't depend on only the density of the films as for the refractive index of the films.

在普通X射线衍射仪上，通过设计狭缝，利用固定靶X射线管进行测量，可以得到X射线反射法（XRR）。对膜层密度、膜厚和表面粗糙度的精度进行了深入的研究.与（100）Si相比，密度的精度为误差的0.3%。当与椭圆偏振法比较时，膜厚度在10%以内。当用原子力显微镜观察方法确认表面粗糙度时，差异约为10%。但是，在测试部分中存在限制，并且发现在5 nm以下的表面粗糙度是必要的。对于采用固定靶X射线管的普通X射线衍射装置的XRR法，通过与其它密度、膜厚和表面粗糙度的测定方法比较，发现它是一种非常优越的方法。当电极间距（D）为1.0mm时，碳膜的密度和折射率高于由D = 0.5mm合成的膜。对于碳膜的折射率，该作用虽然随着膜的密度增加而增加，但并不迟钝。关于这一点，我们可以认为，碳膜的表面由于施加电压的升高而变得粗糙，并且折射率降低。因此，我们不得不把薄膜的粗糙度也作为一个参数来考虑，并且发现折射率不仅仅取决于薄膜的密度，就像薄膜的折射率一样。